Process for preparing novel thin films

Claim 2

A process for preparing a novel thin film which comprises crosslinking the surface of a layer of a surfactant selected from the group consisting of fatty acid salts, sulfuric acid esters of higher alcohols, alkylbenzenesulfonates, alkylnaphthalenesulfonates, naphthalenesulfonic acid-formalin condensates, dialkyl sulfosuccinates, alkyl phosphates, polyoxyethylene sulfates, alkylamine salts, quaternary ammonium salts, polyoxyethylene alkylamines, polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, sorbitan fatty acid esters, polyoxyethylene fatty acid esters, hydroxyethylene sorbitan fatty acid esters, hydroxyethylenehydroxypropylene block polymers, fatty acid monoglycerides, and alkyl betaines, by irradiation with plasma, and then washing away the uncrosslinked portion of said surfactant with water or the like solvent to obtain an extremely thin film.

Claim 3

A process according to claim 1, wherein the surfactant is one member selected from the group consisting of sodium oleate, potassium oleate, sodium lauryl sulfate, sodium laurylbenzene sulfonte, sodium polyoxyethylene alkyl sulfate, sodium polyoxyethylene alkylphenyl sulfate, polyoxyethylene lauryl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxythylene octylphenol ether, polyoxyethylene nonylphenol ether, sorbitian monolaurate, sorbitan monostearat, sorbitan distearate, sorbitan monooleate, sorbitan sesquioleate, sorbitan trioleate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan monooleate, polyethylene glycol monolaurate, polyethylene glycol monostearate, polyethylene glycol distearate, polyethylene glycol monooleate, laurylamine acetate, lauryl trimethylammonium chloride, polyoxylthylene alkylamine, lauryl betaine and saponin.

Claim 4

A process according to claim 1, wherein the thickness of the film is less than 300 microns.

Claim 5

A process according to claim 1, wherein the plasma is generated by glow discharge or corona discharge.

Claim 6

A process according to claim 4, wherein the glow discharge is effected in a gas under a pressure of 0.01 to 10 Torr. using an alternating or direct current of 0.5 to 50 KV.

Claim 7

A process according to claim 5, wherein the gas is helium, argon, nitrogen, hydrogen, oxygen carbon monoxide, carbon dioxide, ammonia, a hydrocarbon having 1 to 10 carbon atoms, an epoxide having 2 to 10 carbon atoms, an alkylamine, or mixture of these substances.

Claim 8

A process according to claim 6, wherein the hydrocarbon having 1 to 10 carbon atoms is methane, ethane, propane, ethylene, propylene or acetylene.

Claim 9

A process according to claim 6, wherein the epoxide having 2 to 10 carbon atoms is ethylene oxide, propylene oxide or isobutylene oxide.

Claim 10

A process according to claim 6, wherein the alkylamine is dimethylamine or triethylamine.

Claim 11

A process according to claim 5, wherein the corona discharge is effected at atmospheric pressure or in an inert gas atmosphere.

Claim 12

A process according to claim 10, wherein the inert gas is nitrogen, helium or argon.

Claim 13

A process according to claim 4, wherein the inert gas is nitrogen.

Claim 14

Thin films obtained according to the process of claim 1.

Claim 15

A process according to claim 1, wherein the plasma is generated by glow discharge in the presence of a nitrogen gas and the surfactant is a nonionic surfactant.