US4055458A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Etching glass with HF and fluorine-containing surfactant
Assignee: Bayer AG
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Filing: 1976-07-30
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Granted: 1977-10-25
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Expires: 1996-07-30
Abstract
Abstract In the etching of glass wherein glass is contacted with an aqueous etching bath containing hydrofluoric acid, and the glass is thereafter removed from the bath and rinsed, the improvement which comprises dissolving in the etching bath an acid-resistant wetting agent. Preferably the wetting agent contains fluorine, e.g. a perfluoralkane sulfonic acid quaternary ammonium salt, a perfluoralkane carboxylic acid salt, an alkoxylation product of a perfluoralkane sulfonamide, or the like.
Inventors
- 👤 Hans Niederprum
- 👤 Heinz Gunter Klein
- 👤 Johann-Nikolaus Meussdoerffer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 02:59
CPC Classifications
C; C03; C03C; C03C15/00; C03C15/02
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
129 words
In the etching of glass wherein glass is contacted with an aqueous etching bath containing hydrofluoric acid, and the glass is thereafter removed from the bath and rinsed, the improvement which comprises dissolving in the etching bath an acid-resistant quaternary ammonium perfluoroalkane sulfonate wetting agent of the formula R F SO 3 - NR 1 R 2 R 3 R 4 +, wherein R F is a linear or branched aliphatic perfluoroalkyl radical with from 6 to 12 carbon atoms, and R 1 , R 2 , R 3 and R 4 each independently is an alkyl or aralkyl radical of up to 18 carbon atoms, or two or three of R 1 , R 2 and R 3 are attached to form a ring through the nitrogen atom.
Claim 2
Dependent Claim
129 words
In the etching of glass wherein glass is contacted with an aqueous etching bath containing hydrofluoric acid, and the glass is thereafter removed from the bath and rinsed, the improvement which comprises dissolving in the etching bath an acid-resistant quaternary ammonium perfluoroalkane sulfonate wetting agent of the formula R F SO 3 - NR 1 R 2 R 3 R 4 +, wherein R F is a linear or branched aliphatic perfluoroalkyl radical with from 6 to 12 carbon atoms, and R 1 , R 2 , R 3 and R 4 each independently is an alkyl or aralkyl radical of up to 18 carbon atoms, or two or three of R 1 , R 2 and R 3 are attached to form a ring through the nitrogen atom.
Claim 3
Dependent Claim
19 words
A process as claimed in claim 1, wherein the wetting agent is present in about 5 to 1000 mg/liter.
Claim 4
Dependent Claim
103 words
An etching solution for treating glass, comprising water, hydrofluoric acid and an acid-resistant quaternary ammonium perfluoroalkane sulfonate wetting agent of the formula R F SO 3 - NR 1 R 2 R 3 R 4 +, wherein R F is a linear or branched aliphatic perfluoralkyl radical with from 6 to 12 carbon atoms, and R 1 , R 2 , R 3 and R 4 each independently is an alkyl or aralkyl radical of up to 18 carbon atoms, or two or three of R 1 , R 2 and R 3 are attached to form a ring through the nitrogen atom.
Claim 5
Dependent Claim
103 words
An etching solution for treating glass, comprising water, hydrofluoric acid and an acid-resistant quaternary ammonium perfluoroalkane sulfonate wetting agent of the formula R F SO 3 - NR 1 R 2 R 3 R 4 +, wherein R F is a linear or branched aliphatic perfluoralkyl radical with from 6 to 12 carbon atoms, and R 1 , R 2 , R 3 and R 4 each independently is an alkyl or aralkyl radical of up to 18 carbon atoms, or two or three of R 1 , R 2 and R 3 are attached to form a ring through the nitrogen atom.
References Cited (Backward Citations)
US2118386A
Cited
US3383255A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-10-24 | 1981-04-25 | 1981-10-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-10-24 | 1985-04-25 | 1985-10-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-10-24 | 1989-04-25 | 1989-10-25 | $7700.00 | Window Closed / Lapsed |