Epoxidized copolymers of styrene, butadiene and isoprene

Claim 2

As a composition of matter, a polymer defined by the formula S-D/S-S in which S is a polystyrene block, D/S is a tapered copolymer block of styrene and an alkadiene selected from the group consisting of butadiene and isoprene having an alkadiene-rich end and a styrene-rich end of which the styrene-rich end is attached to one block S, with the further provision that 5-95% olefinic unsaturations in the D/S blocks have been removed by epoxidation.

Claim 3

A composition in accordance with claim 1 having the structure polystyrene block-tapered butadiene/styrene copolymer block-polystyrene block.

Claim 4

A composition in accordance with claim 1 wherein about 20 to about 50% of the olefinic unsaturations have been removed by epoxidation.

Claim 5

A composition in accordance with claim 1 having a weight average molecular weight of 30,000-250,000.

Claim 6

A composition in accordance with claim 1 formula (1) in which the weight ratio of the unit D/S-S to the block S is within the range of 90/10 to 50/50.

Claim 7

A composition in accordance with claim 1 wherein the overall weight ratio of styrene to alkadiene is within the range of 75/25 to 25/75.

Claim 8

A process for producing an epoxidized copolymer comprising a. contacting alopolymer defined by the formula S-D/S-S in which S is a polystyrene block, D/S is a tapered copolymer block of styrene and an alkadiene selected from the group consisting of butadiene and isoprene having an alkadiene-rich end and a styrene-rich end of which the styrene-rich end is attached to one block S, with an epoxidizing agent such as to remove 5-95% of the olefinic unsaturation of the tapered blocks D/S and b. recovering the epoxidized copolymer.

Claim 9

A process for producing an epoxidized copolymer comprising a. contacting alopolymer defined by the formula S-D/S-S in which S is a polystyrene block, D/S is a tapered copolymer block of styrene and an alkadiene selected from the group consisting of butadiene and isoprene having an alkadiene-rich end and a styrene-rich end of which the styrene-rich end is attached to one block S, with an epoxidizing agent such as to remove 5-95% of the olefinic unsaturation of the tapered blocks D/S and b. recovering the epoxidized copolymer.

Claim 10

A process in accordance with claim 7 wherein said epoxidizing agent is selected from the group consisting of a. peracids, and b. hydrogen peroxide and carboxylic acids or anhydrides.

Claim 11

A process in accordance with claim 8 wherein the epoxidizing agent comprises aqueous hydrogen peroxide and acetic anhydride.

Claim 12

A process in accordance with claim 7 wherein said epoxidizing agent additionally comprises an acid catalyst selected from the group consisting of sulfuric acid and p-toluenesulfonic acid.

Claim 13

A process in accordance with claim 8 for producing a copolymer having the formula S-D/S-S comprising a. introducing a first charge of styrene to an organomonolithium initiator-diluent system and polymerizing said styrene until the entire first charge has been polymerized, forming a polystyrene block; b. adding a second charge of styrene and an alkadiene selected from the group consisting of butadiene, isoprene and mixtures thereof to the polymerization mixture obtained in step a, and polymerizing same onto the polystyrene block obtained in step a, until the entire charge has been polymerized to form a tapered alkadiene-styrene-copolymer block connected by its alkadiene rich end to the polystyrene block and to form a polystyrene end block at the end of the polymerization step b, c. epoxidizing 5-95% of the olefinic unsaturation of the polymer produced in step b by contacting the polymer produced in step b with an epoxidizing agent and thereafter. d. recovering the resulting epoxidized polymer.

Claim 14

A process in accordance with claim 11 wherein said initiator is a butyllithium initiator and said diluent is selected from the group consisting of n-hexane, n-heptane, 2,2,4-trimethylpentane, cyclohexane, benzene, toluene, and the xylenes.