Apparatus for delivering relatively cold UV to a substrate

Claim 1

Apparatus for providing a high flux beam of substantially all ultraviolet light to a substrate comprising an elliptical-like reflector housing having an opening at one end and a first focal line; a linear source of UV light mounted in said housing at the focal line thereof, the longitudinal axis of the line source being contained in a plane of symmetry of the apparatus which is perpendicular to the plane of the opening of said reflector housing; a first optically flat dichroic surface on each side of said plane of symmetry mounted at one end of such dichroic flat surface adjacent said reflector housing opening; a second optically flat dichroic surface on each side of said plane of symmetry connected to the other side of said first dichroic flat surface, said first and second dichroic flat surfaces providing a concave surface on each side of said plane of symmetry when viewed therefrom; a cusp-like member mounted between said concave surfaces so that its longitudinal plane of symmetry coincides with the plane of symmetry of the apparatus and so that the cusp-like member is adjacent the reflector opening beyond the second focal line of said reflector housing whereby substantially all the UV light from said line source strikes a dichroic surface only once and and substantially all the UV light leaving the apparatus has struck a dichroic surface once.