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US4047123A Expired / Lapsed US ⏱️ 0.0 years remaining

Double heterostructure lasers having reduced microstress

Assignee: International Standard Electric Corp
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Filing: 1975-09-22
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Granted: 1977-09-06
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Expires: 1995-09-22
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Abstract

Abstract A conventional construction of light emissive III-V semiconductor device is modified by the inclusion in the active region of the device of not more than 5 atomic percent of a group III or group V substituent of significantly different atomic radius than that of the element for which it is substituted. The microstress field in the neighborhood of dislocation in the active region produces local modification of the concentration of the substituent causing a reduction in the magnitude of the microstress field associated with these dislocations.

Inventors

  • 👤 Paul Anthony Kirkby

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 19:31
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/811; H01; H01S; H01S5/00; H01S5/30; H01S5/32; H01S5/323; H01S5/32308; H10H20/822; H10H20/824

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 77 words
An improved double heterostructure laser of the type having an active region consisting of Group III-V material flanked by at least one layer of Group III-V material comprising: an additional Group III material within the active region composition for providing reduced microstress strain in the laser structure; and an additional Group III material within the Group III-V material of the flanking layers wherein the Group III material comprises gallium and the additional Group III material comprises indium.
Claim 2
Dependent Claim 77 words
An improved double heterostructure laser of the type having an active region consisting of Group III-V material flanked by at least one layer of Group III-V material comprising: an additional Group III material within the active region composition for providing reduced microstress strain in the laser structure; and an additional Group III material within the Group III-V material of the flanking layers wherein the Group III material comprises gallium and the additional Group III material comprises indium.
Claim 3
Dependent Claim 13 words
The laser of claim 1 wherein the additional Group III material comprises boron.
Claim 4
Dependent Claim 13 words
The laser of claim 1 wherein the additional Group III material comprises thallium.
Claim 5
Dependent Claim 17 words
The laser of claim 1 wherein the active region contains an additional group V material comprising nitrogen.
Claim 6
Dependent Claim 17 words
The laser of claim 1 wherein the active region contains an additional group V material comprising bismuth.
Claim 7
Dependent Claim 32 words
The laser of claim 1 wherein the indium comprises 0.6 atomic percent of the active region composition and wherein the indium comprises 0.1 atomic percent of the composition of the flanking layers.
Claim 8
Dependent Claim 46 words
The laser of claim 6 wherein the 0.6 atomic percent indium is substituted for 0.6 atomic percent gallium in the composition of the active region and wherein the 0.1 atomic percent indium is substituted for 0.1 atomic percent gallium in the composition of the flanking layers.

References Cited (Backward Citations)

US3982261A Cited
US3982261B1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-09-05 1981-03-07 1981-09-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-09-05 1985-03-07 1985-09-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-09-05 1989-03-07 1989-09-06 $7700.00 Window Closed / Lapsed

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