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US4027622A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus for doping semiconductors in centrifuge

Assignee: Beckman Instruments GmbH
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Filing: 1976-01-26
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Granted: 1977-06-07
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Expires: 1996-01-26
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Abstract

Abstract A semiconductor material is doped or alloyed under vacuum with an impurity by thermal decomposition and by sedimentation resulting from centrifugal force. The doping material is alternatively applied by evaporation before being subjected to centrifugal force and may be heated up to the melting point before completion of the centrifugal action. A centrifuge is provided having a thermal insulating layer between the outer wall of a rotor and a support for basic semiconductor material to be doped. The doping impurity material to be evaporated onto the basic solid state material is placed in the center of the centrifuge rotor.

Inventors

  • 👤 Paul Schmider

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 03:37
CPC Classifications
C; C23; C23C; C23C10/00; C23C10/18; C23C10/20; C23C10/22; C30; C30B; C30B31/00; C30B31/02

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 74 words
Apparatus for incorporating impurity substance in a solid state material comprising: a. a centrifuge rotor with means for rotating it about an axis, said rotor having a hollow interior with a surrounding wall having an inner surface; b. means for heating disposed adjacent said inner surface, said heating means including means for holding solid state basic material; and, c. a layer of thermal insulating material disposed between said heating means and said inner surface.
Claim 2
Dependent Claim 74 words
Apparatus for incorporating impurity substance in a solid state material comprising: a. a centrifuge rotor with means for rotating it about an axis, said rotor having a hollow interior with a surrounding wall having an inner surface; b. means for heating disposed adjacent said inner surface, said heating means including means for holding solid state basic material; and, c. a layer of thermal insulating material disposed between said heating means and said inner surface.
Claim 3
Dependent Claim 72 words
Apparatus as claimed in claim 1 and additionally comprising: a. a vacuum tight rotor chamber disposed surrounding said rotor having exhaust means and being adapted to be connectable to a source of gaseous compound of an impurity substance capable of thermal decomposition; and, b. a rotor cap adapted to fit on said rotor and including means for the gaseous compound to communicate between the interior of said rotor and said rotor chamber.
Claim 4
Dependent Claim 59 words
Apparatus as claimed in claim 2 and additionally comprising: a. a vacuum tight electrically insulating bearing disposed axially in said rotor; and, b. an electrically conducting member extending through said bearing adapted for connecting to an external source of power and connected to said heating means for providing electrical connection to said heating means when said rotor is rotating.
Claim 5
Dependent Claim 25 words
Apparatus as claimed in claim 1 wherein: said heating means is thin and is disposed on and supported against centrifugal forces by said insulating material.
Claim 6
Dependent Claim 22 words
Apparatus as claimed in claim 4 wherein: said insulating material is comprised of a plurality of flat strips of sintered ceramic material.

References Cited (Backward Citations)

US2996418A Cited
US3389070A Cited
US3502499A Cited
US3607368A Cited
US3598957A Cited
US3699298A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-06-06 1980-12-06 1981-06-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-06-06 1984-12-06 1985-06-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-06-06 1988-12-06 1989-06-07 $7700.00 Window Closed / Lapsed

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