US4006178A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for the manufacture of dicyanovinyl compounds
Assignee: Novartis Corp
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Filing: 1975-03-27
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Granted: 1977-02-01
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Expires: 1995-03-27
Abstract
Abstract Process for the manufacture of aromatic, heteroaromatic or aliphatic compounds which contain at least one radical of the formula ##STR1## wherein R denotes a hydrogen atom or an alkyl, cycloalkyl or aralkyl radical, characterized in that an aromatic or heteroaromatic compound, which carries one or more electron-donating substituent with negative Brown substitution constants δ p + and without mobile hydrogen atoms, a π-excess-hetero-aromatic compound or a CH-acid compound is reacted with a 2,2-dicyanoethylene of the formula ##STR2## wherein X is a halogen atom, preferably chlorine or bromine, and R has the abovementioned meaning, without the presence of Lewis acids, in an anhydrous, preferably organic, medium, with an acid-binding agent optionally being added as a further component.
Inventors
- 👤 Mauro Stagi
- 👤 Tibor Somlo
- 👤 Frantisek Gaspar
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 01:05
CPC Classifications
C; C07; C07C; C07C255/00; C09; C09B; C09B23/00; C09B23/14
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
144 words
A process for the manufacture of a compound of the formula ##STR36## comprising the step of treating a compound, ZH, with a compound of the formula ##STR37## in an anhydrous organic solvent, in the absence of a Lewis acid, wherein R is hydrogen, C 1 -C 4 alkyl, cyclohexyl or benzyl; X is chloro or bromo; and Zh is a compound of the formula ##STR38## wherein Y 1 hydrogen, lower alkyl or lower alkoxy; Y 2 is hydrogen, lower alkyl, lower alkoxy, lower alkanoylamino, lower alkoxycarbonylamino, benzoylamino, chloro or trifluoromethyl; and R 3 and R 2 independently represent lower alkyl, cycloalkyl, aryl, or lower alkyl substituted by aryl, cycloalkyl, lower alkoxy, lower alkylcarbonyloxy, lower alkylaminocarbonyloxy, arylcarbonyloxy, arylaminocarbonyloxy, cyano or chloro, and wherein aryl is phenyl or tolyl and cycloalkyl is cyclohexyl, and wherein lower denotes 1 to 4 carbon atoms in the alkyl moiety.
Claim 2
Dependent Claim
144 words
A process for the manufacture of a compound of the formula ##STR36## comprising the step of treating a compound, ZH, with a compound of the formula ##STR37## in an anhydrous organic solvent, in the absence of a Lewis acid, wherein R is hydrogen, C 1 -C 4 alkyl, cyclohexyl or benzyl; X is chloro or bromo; and Zh is a compound of the formula ##STR38## wherein Y 1 hydrogen, lower alkyl or lower alkoxy; Y 2 is hydrogen, lower alkyl, lower alkoxy, lower alkanoylamino, lower alkoxycarbonylamino, benzoylamino, chloro or trifluoromethyl; and R 3 and R 2 independently represent lower alkyl, cycloalkyl, aryl, or lower alkyl substituted by aryl, cycloalkyl, lower alkoxy, lower alkylcarbonyloxy, lower alkylaminocarbonyloxy, arylcarbonyloxy, arylaminocarbonyloxy, cyano or chloro, and wherein aryl is phenyl or tolyl and cycloalkyl is cyclohexyl, and wherein lower denotes 1 to 4 carbon atoms in the alkyl moiety.
Claim 3
Dependent Claim
13 words
The process of claim 1, wherein triethylamine is added to the treatment medium.
Claim 4
Dependent Claim
18 words
The process of claim 1, wherein the organic solvent has a dielectric constant which is less than 15.
Claim 5
Dependent Claim
24 words
The process of claim 1, wherein the organic solvent is selected from the group consisting of chlorobenzene, ethylenechloride, diethyl ether, and glacial acetic acid.
Claim 6
Dependent Claim
19 words
The process of claim 1, wherein the treatment is carried out at a temperature of 0° to 200° C.
Claim 7
Dependent Claim
22 words
The process of claim 5, wherein the treatment is carried out at a temperature of the range of 20° to 140° C.
Claim 8
Dependent Claim
17 words
The process of claim 1, wherein the compound of formula ZH is used in a stoichiometric amount.
Claim 9
Dependent Claim
19 words
The process of claim 1, wherein the compound of formula ZH is used in a 2-fold to 3-fold excess.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-02-01 | 1980-08-02 | 1981-02-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-02-01 | 1984-08-02 | 1985-02-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-02-01 | 1988-08-02 | 1989-02-01 | $7700.00 | Window Closed / Lapsed |