US3999564A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Continuous etching and etched material recovery system
Assignee: Pesek Engineering and Mfg Co
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Filing: 1976-01-09
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Granted: 1976-12-28
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Expires: 1996-01-09
Abstract
Abstract A system and the required apparatus to provide a continuous recovery for the material being etched including the system and apparatus for recycling the etchant material for reuse in the etching device. The system includes a device for etching, an ammoniating system for the constant restoration of the etchant to a proper pH level for efficient alkaline etching and a controlled system for the systematic removal of the material which is etched and is in solution within the etchant, which controlled system includes the regeneration of the etchant material.
Inventors
- 👤 C. Paul Pesek
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 20:59
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/46
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
169 words
A system and apparatus for the continuous regeneration and reuse of alkaline etchant for the etching of copper material which apparatus includes an etching device in which the material to be etched is placed for exposure to the etchant material, said system and apparatus including: a. a copper precipitation and removal circuit arranged to receive etchant from and redeliver the same, after removal of copper therefrom, to the etching device, said circuit including: 1. first fluid pumping means for withdrawing copper bearing etchant from the etching device and returning etchant to the etching device after removal of the copper therefrom; 2. a source of hydrochloric acid; 3. means for introducing hydrochloric acid to the etchant withdrawn from the etching device to lower the pH thereof and form copper salts therein; 4. filter means for removal of the formed copper salts from the etchant; 5. means for delivering the exposed etchant to said filter means; and, 6. means for delivering the etchant, subsequent to filtering, to said fluid pumping means.
Claim 2
Independent Claim
169 words
A system and apparatus for the continuous regeneration and reuse of alkaline etchant for the etching of copper material which apparatus includes an etching device in which the material to be etched is placed for exposure to the etchant material, said system and apparatus including: a. a copper precipitation and removal circuit arranged to receive etchant from and redeliver the same, after removal of copper therefrom, to the etching device, said circuit including: 1. first fluid pumping means for withdrawing copper bearing etchant from the etching device and returning etchant to the etching device after removal of the copper therefrom; 2. a source of hydrochloric acid; 3. means for introducing hydrochloric acid to the etchant withdrawn from the etching device to lower the pH thereof and form copper salts therein; 4. filter means for removal of the formed copper salts from the etchant; 5. means for delivering the exposed etchant to said filter means; and, 6. means for delivering the etchant, subsequent to filtering, to said fluid pumping means.
Claim 3
Dependent Claim
41 words
The system and apparatus as set forth in claim 1 and: a. a reactor container arranged to receive the copper bearing etchant from said pumping means; and, b. said means for introducing the hydrochloric acid directing the acid to said reactor.
Claim 4
Dependent Claim
36 words
The system and apparatus as set forth in claim 2 and means for controlling the introduction of hydrochloric acid to the copper bearing etchant including means to sense the pH of the etchant within said reactor.
Claim 5
Dependent Claim
32 words
The system and apparatus as set forth in claim 3 and said hydrochloric acid introduction control means arranged to maintain the pH within said reactor in the range of 6.8 to 7.5.
Claim 6
Dependent Claim
45 words
The system and apparatus as set forth in claim 1 and said filter means including a salt retaining container arranged to receive etchant subsequent to hydrochloric acid addition, said container and filter arranged to filter the salts from the etchant for storage in said container.
Claim 7
Dependent Claim
23 words
The system and apparatus as set forth in claim 5 and said salt retaining container being removable from and replaceable in said circuit.
Claim 8
Dependent Claim
22 words
The system and apparatus as set forth in claim 1 and storage means arranged to receive filtered etchant from said filter means.
Claim 9
Dependent Claim
28 words
The system and apparatus as set forth in claim 7 and second pumping means arranged to draw etchant through said filter for delivery thereof to said storage means.
Claim 10
Dependent Claim
34 words
The system and apparatus as set forth in claim 8 and means controlling said second pumping means, said controlling means being responsive to the means for delivering the exposed etchant to said filter means.
Claim 11
Dependent Claim
49 words
The system and apparatus as set forth in claim 9 and said second pumping controlling means actuating said second pumping means upon the delivery of etchant to said filter and deactivating said second pumping means a predetermined period of time following the cessation of etchant delivery to said filter.
Claim 12
Dependent Claim
41 words
The system and apparatus as set forth in claim 1 and specific gravity sensing means arranged to sense the specific gravity of the etchant within the etching device and activating said first pumping means in response to a predetermined reading thereof.
Claim 13
Dependent Claim
19 words
The system and apparatus as set forth in claim 1 and means for introducing ammonium chloride into said circuit.
Claim 14
Dependent Claim
34 words
The system and apparatus as set forth in claim 12 and said means for the introduction of ammonium chloride being arranged for such introduction prior to the introduction of hydrochloric acid to the etchant.
Claim 15
Dependent Claim
31 words
The system and apparatus as set forth in claim 12 and said means for introduction of ammonium chloride being arranged for such introduction to such etchant subsequent to the filtering thereof.
Claim 16
Dependent Claim
68 words
The system and apparatus as set forth in claim 1 and; a. an ammonia introduction circuit arranged to receive etchant from and deliver the same to the etching device, including: 1. an ammoniating tower; 2. third pumping means for receiving etchant from the etching device and delivering the same to said tower; 3. a source of ammonia connected to said tower for the delivery of ammonia there; and,
Claim 17
Dependent Claim
13 words
means for controlling the delivery of ammonia to said tower from said source.
Claim 18
Dependent Claim
13 words
means for controlling the delivery of ammonia to said tower from said source.
Claim 19
Dependent Claim
33 words
The system and apparatus as set forth in claim 15 and said ammonia circuit including pH sensing means associated with said delivery controlling means for controlling the delivery of ammonia to the etchant.
References Cited (Backward Citations)
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Cited
US3327721A
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US3427198A
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US3526560A
Cited
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Cited
US3933544A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-12-28 | 1980-06-28 | 1980-12-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-12-28 | 1984-06-28 | 1984-12-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-12-28 | 1988-06-28 | 1988-12-28 | $7700.00 | Window Closed / Lapsed |