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US3990100A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor device having an antireflective coating

Assignee: Sony Corp
•
Filing: 1975-10-02
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Granted: 1976-11-02
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Expires: 1995-10-02
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Abstract

Abstract A polycrystalline silicon layer provides an antireflective coating on a semiconductor surface of a photo-sensitive detector, the polycrystalline silicon layer containing from 25 to 45 atomic percent of oxygen and having a refractive index intermediate that of the semiconductor crystal and the exterior environment.

Inventors

  • 👤 Takayoshi Mamine
  • 👤 Takeshi Matsushita

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 18:41
CPC Classifications
H; H10; H10F; H10F77/00; H10F77/30; H10F77/306; H10F77/311; H10F77/315; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/546

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 37 words
A photo sensitive semiconductor device comprising a semiconductor crystal substrate and an antireflective coating on said substrate, said antireflective coating including a polycrystalline silicon layer containing oxygen in an amount of from 25 to 45 atomic percent.
Claim 2
Dependent Claim 37 words
A photo sensitive semiconductor device comprising a semiconductor crystal substrate and an antireflective coating on said substrate, said antireflective coating including a polycrystalline silicon layer containing oxygen in an amount of from 25 to 45 atomic percent.
Claim 3
Dependent Claim 14 words
A device according to claim 1 in which said substrate is composed of silicon.
Claim 4
Dependent Claim 24 words
A device according to claim 1 in which the thickness of said polycrystalline silicon layer is in the range from 600 to 1,000 Angstroms.
Claim 5
Dependent Claim 19 words
A device according to claim 1 in which a silicon dioxide layer is formed over said polycrystalline silicon layer.
Claim 6
Dependent Claim 19 words
A device according to claim 1 which includes an epoxy resin coating over at least said polycrystalline silicon layer.
Claim 7
Dependent Claim 26 words
A device according to claim 1 which includes at least one P-N junction in said substrate, and means for applying a forward bias to said junction.
Claim 8
Dependent Claim 26 words
A device according to claim 1 which includes at least one P-N junction in said substrate, and means for applying a reverse bias to said junction.
Claim 9
Dependent Claim 40 words
A semiconductor solar cell comprising a silicon substrate having at least one P-N junction therein and a polycrystalline silicon layer formed on said substrate, said polycrystalline silicon layer containing oxygen in an amount of from 25 to 45 atomic percent.
Claim 10
Dependent Claim 40 words
A semiconductor solar cell comprising a silicon substrate having at least one P-N junction therein and a polycrystalline silicon layer formed on said substrate, said polycrystalline silicon layer containing oxygen in an amount of from 25 to 45 atomic percent.

References Cited (Backward Citations)

US3760240A Cited
US3743847A Cited
US3900350A Cited
US3922774A Cited
US3886587A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-11-02 1980-05-03 1980-11-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-11-02 1984-05-03 1984-11-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-11-02 1988-05-03 1988-11-02 $7700.00 Window Closed / Lapsed

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