US3988152A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Epoxy resin photoresist with iodoform and bismuth triphenyl
Assignee: Primerica Inc
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Filing: 1975-02-26
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Granted: 1976-10-26
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Expires: 1995-02-26
Abstract
Abstract Photopolymerizable compositions and processes for photopolymerizing such compositions are provided, said process comprising admixing with said epoxides, photosensitive organohalogen compounds in combination with an organometallic compound and thereafter applying energy to the resulting mixture. The organohalogens decompose to liberate an active catalyst which then serves to initiate polymerization of the epoxide material. The organometallic compound functions synergistically with the organohalogen to enhance the film forming properties of the resulting polymer and or sensitivity of the polymerizable system.
Inventors
- 👤 Jerome Roteman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 11:58
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/029; G03F7/0295; G03F7/038; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/126; Y10S430/143
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
171 words
A method of preparing a photoresist image which comprises: forming a mixture of (a) a monomeric or prepolymeric epoxide material or mixture thereof, said epoxide material being polymerizable to higher molecular weights through the action of a cationic catalyst; with (b) a radiation-sensitive catalyst precursor which decomposes upon exposure to electromagnetic or electro-beam radiation to provide an active catalyst effective to initiate polymerization of said epoxide material, said precursor being an organohalogen compound wherein the organo radicals are alkyl, aryl, alkaryl, aralkyl, alkoxy and aroxy in combination with an oranometallic compound having the formula R 3 M wherein M is P, As, Sb or Bi and R is a hydrocarbyl radical or hydrogen with the proviso that at least one R is a hydrocarbyl radical; applying said mixture to a substrate; masking predetermined portions of said substrate; exposing said unmasked portions of said substrate to electromagnetic or electron beam irradiation to effect polymerization; removing said masking means; and thereafter applying a suitable solvent for removal of unpolymerized portions of said mixture.
Claim 2
Independent Claim
171 words
A method of preparing a photoresist image which comprises: forming a mixture of (a) a monomeric or prepolymeric epoxide material or mixture thereof, said epoxide material being polymerizable to higher molecular weights through the action of a cationic catalyst; with (b) a radiation-sensitive catalyst precursor which decomposes upon exposure to electromagnetic or electro-beam radiation to provide an active catalyst effective to initiate polymerization of said epoxide material, said precursor being an organohalogen compound wherein the organo radicals are alkyl, aryl, alkaryl, aralkyl, alkoxy and aroxy in combination with an oranometallic compound having the formula R 3 M wherein M is P, As, Sb or Bi and R is a hydrocarbyl radical or hydrogen with the proviso that at least one R is a hydrocarbyl radical; applying said mixture to a substrate; masking predetermined portions of said substrate; exposing said unmasked portions of said substrate to electromagnetic or electron beam irradiation to effect polymerization; removing said masking means; and thereafter applying a suitable solvent for removal of unpolymerized portions of said mixture.
Claim 3
Dependent Claim
10 words
The method of claim 1 wherein the substrate is metal.
Claim 4
Dependent Claim
9 words
The method of claim 1 wherein R is phenyl.
Claim 5
Dependent Claim
11 words
The method of claim 1 wherein said organometallic compound is triphenylbismuthine.
Claim 6
Dependent Claim
11 words
The method of claim 1 wherein said organohalogen compound is iodoform.
Claim 7
Dependent Claim
21 words
The method of claim 1 wherein said epoxide material is a glycidyl ether of bisphenol A or an epoxy phenol novolac.
Claim 8
Dependent Claim
16 words
The method of claim 1 wherein said organometallic compound is triphenylbismuthine and said organohalogen is iodoform.
Claim 9
Dependent Claim
12 words
The method of claim 7 wherein said radiation is electron beam radiation.
Claim 10
Dependent Claim
11 words
The method of claim 7 wherein said radiation is electromagnetic radiation.
Claim 11
Dependent Claim
27 words
The method of claim 7 wherein said catalyst precursor is present in an amount by weight equal to between about 5% and 50% of the epoxide material.
References Cited (Backward Citations)
US3427259A
Cited
US3522194A
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US3708296A
Cited
US3720634A
Cited
US3711391A
Cited
US3721617A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-10-26 | 1980-04-26 | 1980-10-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-10-26 | 1984-04-26 | 1984-10-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-10-26 | 1988-04-26 | 1988-10-26 | $7700.00 | Window Closed / Lapsed |