Vacuum braking system for semiconductor wafers

Claim 2

A vacuum braking system for uniformly and evenly stopping the travel of a pneumatically conveyed semiconductor wafer at a single position within an activated braking station on an air track regardless of the direction of wafer travel comprising: a. a pair of elongated air inlets disposed within said braking station with the elongated portion of each of said inlets substantially parallel to the direction of wafer travel on said air track of and each inlet having a length slightly less than the lengthwise dimension of said wafer disposed directly over said elongated inlet when said wafer is stopped; and b. means for selectively supplying a vacuum to said elongated air inlets.

Claim 3

The system of claim 1 wherein said means for selectively supplying a vacuum comprises a vacuum source communicating through a valve means with said inlets.

Claim 4

The system of claim 2 further comprising means for regulating the air flowing through said elongated inlets.

Claim 5

The system of claim 3 wherein said means for regulating comprises a restricted passageway communicating between said vacuum source through said valve means and with each end of said elongated inlets.

Claim 6

The system of claim 4 wherein said valve means is a remote control valve which in the closed position vents said inlets to atmosphere.

Claim 7

The system of claim 5 further comprising a vacuum manifold communicating between said vacuum source through said remote control valve and said restricted passageways.

Claim 8

The system of claim 6 further comprising: a. a second pair of elongated air inlets identical with said first pair and being disposed at the intersection of two air tracks within a braking station with the elongated portion of the second pair of inlets perpendicular to the elongated portion of said first pair and so positioned as to form a single square inlet; and b. restrictive passageways communicating between the corners of said square inlet and said vacuum manifold.

Claim 9

In a vacuum braking system for stopping the travel of a wafer wherein a vacuum source communicates with air inlets disposed in an air track by means of a control valve, the improvement comprising: a pair of elongated air inlets disposed in said air track with the elongated portion of each inlet substantially parallel to said wafer travel on said track, and each inlet having a length slightly less than the lengthwise dimension of said wafer disposed directly over said elongated air inlet when said wafer is stopped.

Claim 10

In a vacuum braking system for stopping the travel of a wafer wherein a vacuum source communicates with air inlets disposed in an air track by means of a control valve, the improvement comprising: a pair of elongated air inlets disposed in said air track with the elongated portion of each inlet substantially parallel to said wafer travel on said track, and each inlet having a length slightly less than the lengthwise dimension of said wafer disposed directly over said elongated air inlet when said wafer is stopped.

Claim 11

The system of claim 8 further comprising pressure regulating passageways communicating between either end of each of said elongated air inlets and said vacuum source through said control valve.

Claim 12

The system of claim 9 further comprising a vacuum manifold communicating between said vacuum source through said control valve and said pressure regulating passageways.

Claim 13

The system of claim 10 further comprising: a. a second pair of elongated air inlets identical with said first pair and being disposed at the intersection of two air tracks within a braking station with the elongated portion of said second pair of inlets perpendicular to the elongated portion of said first pair and so as positioned as to form a single square inlet; and b. restrictive passageways communicating between the corners of said square inlet and said vacuum manifold.

Claim 14

The system of claim 11 wherein said valve means is a remote control valve which in the closed position vents said inlet to the atmosphere.

Claim 15

A vacuum braking system for uniformly and evenly stopping the travel of a pneumatically conveyed semiconductor wafer at a single position within an activated braking station on an air track regardless of the direction of wafer travel comprising: a. a vacuum source; b. remotely controlled valve means wherein a controlled side of said valve means is vented to atmosphere when said valve is in the closed position; c. a vacuum manifold disposed on the underneath side of said air track and communicating with said vacuum source through said controlled side of said remotely controlled valve means; d. a pair of elongated air inlets disposed within a braking station flush with the top surface of an air track wherein the elongated portion of each of said inlets is substantially parallel to the direction of said wafer travel on said air track and the length of each of said air inlets is slightly less than the lengthwise dimension of a wafer disposed directly over said elongated inlet when the wafer is stopped at said single position; and e. two pair of restrictive passageways, each pair communicating between the end of one of said elongated air inlets and said vacuum manifold.

Claim 16

A vacuum braking system for uniformly and evenly stopping the travel of a pneumatically conveyed semiconductor wafer at a single position within an activated braking station on an air track regardless of the direction of wafer travel comprising: a. a vacuum source; b. remotely controlled valve means wherein a controlled side of said valve means is vented to atmosphere when said valve is in the closed position; c. a vacuum manifold disposed on the underneath side of said air track and communicating with said vacuum source through said controlled side of said remotely controlled valve means; d. a pair of elongated air inlets disposed within a braking station flush with the top surface of an air track wherein the elongated portion of each of said inlets is substantially parallel to the direction of said wafer travel on said air track and the length of each of said air inlets is slightly less than the lengthwise dimension of a wafer disposed directly over said elongated inlet when the wafer is stopped at said single position; and e. two pair of restrictive passageways, each pair communicating between the end of one of said elongated air inlets and said vacuum manifold.

Claim 17

The system of claim 13 further comprising a second pair of elongated inlets identical with said first pair and being disposed at the intersection of two air tracks within a braking station with the elongated portion of said second pair of inlets perpendicular to the elongated portion of said first pair and so positioned as to form a single square inlet.

Claim 18

The system of claim 14 wherein said two pair of restrictive passageways communicate between the corner of said square inlet and said vacuum manifold.

Claim 19

A vacuum braking system for uniformly and evenly stopping the travel of a pneumatically conveyed semiconductor wafer at a single position within an activated braking station at the intersection of two air tracks regardless of the direction of wafer travel comprising: a. A first pair of elongated air inlets disposed within said braking station with the elongated portion of said inlet substantially parallel to the direction of wafer travel on one of the air tracks at said intersection and having a length slightly less than the lengthwise dimension of the wafer disposed directly over the elongated inlet when the wafer is stopped; b. a second pair of elongated air inlets identical to said first pair disposed within said braking station with the elongated portions of said second pair substantially perpendicular to the elongated portions of said first pair and so positioned as to form a single square inlet; and c. means for selectively supplying a vacuum to said single square inlet.

Claim 20

A vacuum braking system for uniformly and evenly stopping the travel of a pneumatically conveyed semiconductor wafer at a single position within an activated braking station at the intersection of two air tracks regardless of the direction of wafer travel comprising: a. A first pair of elongated air inlets disposed within said braking station with the elongated portion of said inlet substantially parallel to the direction of wafer travel on one of the air tracks at said intersection and having a length slightly less than the lengthwise dimension of the wafer disposed directly over the elongated inlet when the wafer is stopped; b. a second pair of elongated air inlets identical to said first pair disposed within said braking station with the elongated portions of said second pair substantially perpendicular to the elongated portions of said first pair and so positioned as to form a single square inlet; and c. means for selectively supplying a vacuum to said single square inlet.

Claim 21

The system of claim 16 wherein said means for selectively supplying a vacuum comprises a vacuum source communicating through a valve means with said square inlet.

Claim 22

The system of claim 17 further comprising a means for regulating the air flowing through said square inlet.

Claim 23

The system of claim 18 wherein said means for regulating comprises restrictive passageways communicating between the corners of said square inlet and said vacuum source through said valve means.

Claim 24

The system of claim 19 wherein said valve means is a remote control valve which in the closed position vents said square inlet to atmosphere.

Claim 25

The system of claim 20 further comprising a vacuum manifold communicating between said vacuum source through said remote control valve and said restrictive passageways.