US3974053A
Expired / Lapsed
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Method of polymerizing ethylenically unsaturated materials by irradiation and composition for use therein
Assignee: Imperial Chemical Industries Ltd
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Filing: 1974-11-19
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Granted: 1976-08-10
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Expires: 1994-11-19
Abstract
Abstract Photopolymerizable compositions consisting essentially of at least one polymerizable ethylenically unsaturated material and a photosensitive catalyst comprising A. from 0.5% to 5% by weight based on the ethylenically unsaturated material of at least one photosensitizer having the structure ##EQU1## wherein Ph is phenyl, halogen-substituted phenyl, phenylene or halogen-substituted phenylene and A is a cyclic hydrocarbyl group, a halogen-substituted cyclic hydrocarbyl group or a group of the formula ##EQU2## where X and Y each is hydrogen, a hydrocarbyl or a halogen-substituted hydrocarbyl group, and B. from 1 to 5% by weight based on the ethylenically unsaturated material of a reducing agent capable of reducing the photosensitizer when the photosensitizer is in an excited state. Also described is a process of preparing polymeric materials by irradiating the foregoing polymerizable composition at a wavelength capable of exciting the photosensitizer to an excited state.
Inventors
- 👤 Josef Nemcek
- 👤 Nicholas Heap
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 21:23
CPC Classifications
C; C08; C08F; C08F299/00; C08F299/02; C08F299/04; C08F299/0407; C08F299/0421; C08F299/0428; C08F299/0435; C08F2/00; C08F2/46; C08F2/48; C08F2/50
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
114 words
A photopolymerizable composition consisting essentially of at least one polymerizable ethylenically unsaturated material and a photosensitive catalyst comprising a. from 0.5 to 5% by weight based on the ethylenically unsaturated material of at least one photosensitizer having the structure ##EQU3## wherein Ph is phenyl, halogen-substituted phenyl, phenylene or halogen-substituted phenylene and A is a cyclic hydrocarbyl group, a halogen-substituted cyclic hydrocarbyl group or a group of the formula ##EQU4## where X and Y each is hydrogen, a hydrocarbyl or a halogen-substituted hydrocarbyl group, and b. from 1 to 5% by weight based on the ethylenically unsaturated material of a reducing agent capable of reducing the photosensitizer when the photosensitizer is in an excited state.
Claim 2
Dependent Claim
114 words
A photopolymerizable composition consisting essentially of at least one polymerizable ethylenically unsaturated material and a photosensitive catalyst comprising a. from 0.5 to 5% by weight based on the ethylenically unsaturated material of at least one photosensitizer having the structure ##EQU3## wherein Ph is phenyl, halogen-substituted phenyl, phenylene or halogen-substituted phenylene and A is a cyclic hydrocarbyl group, a halogen-substituted cyclic hydrocarbyl group or a group of the formula ##EQU4## where X and Y each is hydrogen, a hydrocarbyl or a halogen-substituted hydrocarbyl group, and b. from 1 to 5% by weight based on the ethylenically unsaturated material of a reducing agent capable of reducing the photosensitizer when the photosensitizer is in an excited state.
Claim 3
Dependent Claim
16 words
A photopolymerizable composition as claimed in claim 1 in which the photosensitizer has the structure ##STR14##
Claim 4
Dependent Claim
22 words
A photopolymerizable composition as claimed in claim 2 in which in the photosensitizer each of the groups Ph is the phenylene group.
Claim 5
Dependent Claim
15 words
A photopolymerizable composition as claimed in claim 3 in which the photosensitizer is oxalyl indigo.
Claim 6
Dependent Claim
115 words
A photopolymerizable composition as claimed in claim 1 in which the reducing agent has the structure ##STR15## where M is an element of Group Vb of the Periodic Table of the Elements and the units R 2 , R 3 and R 4 , which may be the same or different, are hydrogen atoms, hydrocarbyl groups, substituted hydrocarbyl groups, or groups in which two units R together with the element M form a cyclic ring system, no more than two of the units R being hydrogen atoms and, where the element M is attached directly to an aromatic group R at least one of the other groups R has a ##STR16## group attached to M.
Claim 7
Dependent Claim
39 words
A photopolymerizable composition as claimed in claim 5 in which in the reducing agent having the structure ##STR17## the groups R 2 , R 3 and R 4 are free of aromatic groups attached directly to the element M.
Claim 8
Dependent Claim
19 words
A photopolymerizable composition as claimed in claim 5 in which in the reducing agent the element M is nitrogen.
Claim 9
Dependent Claim
16 words
A photopolymerizable composition as claimed in claim 7 in which the reducing agent is dimethylaminoethyl methacrylate.
Claim 10
Dependent Claim
26 words
A photopolymerizable composition as claimed in claim 1 in which the ethylenically unsaturated material comprises at least one monomer containing ethylenic unsaturation in a terminal group.
Claim 11
Dependent Claim
19 words
A photopolymerizable composition as claimed in claim 9 in which the composition includes at least one ethylenically unsaturated polyester.
Claim 12
Dependent Claim
28 words
A photopolymerizable composition as claimed in claim 9 in which the ethylenically unsaturated monomer is at least one of methyl methacrylate, styrene, vinyl pyrollidone, acrylonitrile and vinyl acetate.
Claim 13
Dependent Claim
38 words
A photopolymerizable composition as claimed in claim 9 in which the ethylenically unsaturated monomer is at least one of hydroxyethyl methacrylate and a reaction product of hydroxyethyl methacrylate and an isocyanate-ended adduct of 4:4'-diphenylmethane diisocyanate and oxypropylated bisphenol-A.
Claim 14
Dependent Claim
14 words
A photopolymerizable composition as claimed in claim 9 which includes at least one pigment.
Claim 15
Dependent Claim
36 words
A process for the preparation of a polymeric material which comprises irradiating a photopolymerizable composition as claimed in claim 1 with radiation having a wavelength which is capable of exciting the photosensitizer to an excited state.
Claim 16
Dependent Claim
23 words
A process as claimed in claim 14 in which the radiation has a wavelength in the range of 230 mμ to 600 mμ.
Claim 17
Dependent Claim
16 words
A process as claimed in claim 15 in which the radiation is or includes visible light.
Claim 18
Dependent Claim
17 words
A polymeric material produced according to claim 14 which is in the form of a paint film.
Claim 19
Dependent Claim
15 words
A photopolymerizable composition as claimed in claim 1 in which X and Y are Ph.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-08-10 | 1980-02-09 | 1980-08-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-08-10 | 1984-02-09 | 1984-08-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-08-10 | 1988-02-09 | 1988-08-10 | $7700.00 | Window Closed / Lapsed |