Arrangement for the fluid treatment, especially etching, of objects in assembly-line-like fashion

Claim 1

An arrangement for the fluid treatment, particularly etching, of objects, particularly printed circuits, mold sections, and the like, in assembly-line-like fashion, comprising, in combination, a closed treatment fluid supply chamber; a first treatment chamber located above said treatment fluid supply chamber; at least one additional treatment chamber located above said first treatment chamber, said treatment chambers being separated from each other by separating walls, each of said treatment chambers having a side wall; an intermediate chamber between said treatment chambers and partly bounded by said separating walls, said intermediate chamber spacing said treatment chambers from one another; conveyor means for conveying objects along a first predetermined path leading through said first treatment chamber at a first speed, and along a second predetermined path leading through said additional treatment chamber at a second speed; treatment fluid pumping and emitting means operative for pumping treatment fluid up from said treatment fluid supply chamber and for discharging the thusly pumped treatment fluid onto objects in both said first and said additional treatment chambers; control equipment in said intermediate chamber for controlling the operation of the arrangement; and at least one observation and access window of trapezoidal shape mounted in each respective side wall for sliding with respect thereto in a predetermined direction between a closed and an open position and having marginal portions diverging in said direction and engaging said side wall when said window is in said closed position thereof, whereas a slight movement of said window in said direction dissociates said marginal portions from said side wall so that movement of said window towards said open position is facilitated even when said window is jammed in said side wall.