Process for depositing transparent electrically conductive tin oxide coatings on a substrate

Claim 2

A process of depositing a coating of tin oxide on a substrate which comprises: a. heating the substrate from about 375° to about 500°C., b. heating dibutyl tin diacetate in a stream of an inert carrier gas to a temperature from about 100° to about 200°C. to vaporize it, and c. contacting the carrier gas-dibutyl tin diacetate gas stream with the substrate in an oxidizing atmosphere until a coating of tin oxide has been deposited on the substrate.

Claim 3

A process according to claim 1 wherein the carrier gas-dibutyl tin diacetate gas stream temperature is maintained in the range between about 100° to about 150°C.

Claim 4

A process according to claim 2 wherein the substrate temperature is from about 425° to about 450°C.

Claim 5

A process according to claim 3 wherein the substrate is glass having a melting point above 450°C.

Claim 6

A process according to claim 1 wherein the oxidizing atmosphere contains water vapor.

Claim 7

An article prepared by the process of claim 1.

Claim 8

An article prepared by the process of claim 5.

Claim 9

A process of depositing an antimony-doped tin oxide coating on a substrate which comprises a. heating the substrate to about 500° to about 575°C., b. heating a volatile organotin compound having a vaporization temperature below about 200°C. of the formula (R ) 2 Sn ( OOCR) 2 or (R 3 Sn ) 2 O wherein R is a lower alkyl group in a stream of an inert carrier gas to at least its vaporization temperature, c. admixing the carrier gas-organotin vapor with a carrier gas stream containing vaporized antimony pentachloride, and d. contacting the organometallic vapors with the heated substrate in an oxidizing atmosphere until a coating of antimony-doped tin oxide has been deposited on the substrate.

Claim 10

A process of depositing an antimony-doped tin oxide coating on a substrate which comprises a. heating the substrate to about 500° to about 575°C., b. heating a volatile organotin compound having a vaporization temperature below about 200°C. of the formula (R ) 2 Sn ( OOCR) 2 or (R 3 Sn ) 2 O wherein R is a lower alkyl group in a stream of an inert carrier gas to at least its vaporization temperature, c. admixing the carrier gas-organotin vapor with a carrier gas stream containing vaporized antimony pentachloride, and d. contacting the organometallic vapors with the heated substrate in an oxidizing atmosphere until a coating of antimony-doped tin oxide has been deposited on the substrate.

Claim 11

A process according to claim 8 wherein the organotin compound is dibutyl tin diacetate.

Claim 12

A process according to claim 8 wherein the oxidizing atmosphere contains water vapor.

Claim 13

A process of depositing transparent, uniform, electrically conductive coatings of tin oxide on a vidicon faceplate which comprises: a. vaporizing dibutyl tin diacetate in a stream of an inert carrier gas at a temperature of from about 100° to about 200°C., b. heating the faceplate to a temperature from about 375° to about 450°C., and c. contacting the heated faceplate with the dibutyl tin diacetate-carrier gas stream in the presence of oxygen for about 5 to about 15 minutes so as to form a coating of tin oxide on the faceplate.

Claim 14

A process of depositing transparent, uniform, electrically conductive coatings of tin oxide on a vidicon faceplate which comprises: a. vaporizing dibutyl tin diacetate in a stream of an inert carrier gas at a temperature of from about 100° to about 200°C., b. heating the faceplate to a temperature from about 375° to about 450°C., and c. contacting the heated faceplate with the dibutyl tin diacetate-carrier gas stream in the presence of oxygen for about 5 to about 15 minutes so as to form a coating of tin oxide on the faceplate.

Claim 15

A process according to claim 11 wherein the oxidizing atmosphere contains water vapor.