Abstract The center-to-center spacings of a photoresist pattern for an array of holes applied to a thin metal sheet are increased by uniformly stretching the thin metal sheet in all directions along the plane of the sheet. The uniform stretching is provided by securely clamping the periphery of the sheet and applying an annular force against the face of the sheet, within the periphery of the sheet and around the photoresist pattern. The technique used in the construction of ion thruster grid units wherein the outer or downstream grid is subjected to uniform stretching prior to convex molding. The technique provides alignment of the holes of grid pairs so as to direct the ion beamlets in a direction parallel to the axis of the grid unit and thereby provide optimization of the available thrust.
Inventors
👤 Bruce A. Banks
Bibliographic Details
Application Number—
JurisdictionUS
Data Sourcegoogle_patents
Last Synchronized2026-11-05 13:19
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/02; H01J9/14
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
128 words
In a method of forming an ion thruster grid unit comprising the steps of applying first and second thin metal sheets to photoresist patterns corresponding to an array of holes; molding said thin metal sheets to impart a predetermined shape thereto; chemically etching the thin metal sheets to form holes therethrough according to said photoresist patterns; and mounting said molded sheets in parallel side by side relationship such that the two sheets are separated a small axial distance from each other; the improvement which comprises uniformly stretching one of said grids in the plane of said grid prior to said molding step such that said photoresist pattern corresponding to an array of holes is enlarged to increase the center-to-center spacing of the holes of said array of holes.
Claim 2
Dependent Claim
128 words
In a method of forming an ion thruster grid unit comprising the steps of applying first and second thin metal sheets to photoresist patterns corresponding to an array of holes; molding said thin metal sheets to impart a predetermined shape thereto; chemically etching the thin metal sheets to form holes therethrough according to said photoresist patterns; and mounting said molded sheets in parallel side by side relationship such that the two sheets are separated a small axial distance from each other; the improvement which comprises uniformly stretching one of said grids in the plane of said grid prior to said molding step such that said photoresist pattern corresponding to an array of holes is enlarged to increase the center-to-center spacing of the holes of said array of holes.
Claim 3
Dependent Claim
24 words
The method of claim 1 wherein said two sheets are combined and simultaneously dished in said dishing step to impart a convex shape thereto.
Claim 4
Dependent Claim
52 words
The method of claim 1 wherein said stretching step comprises securing the periphery of said thin metal sheet constituting said one grid against movement and pressing a circular die having a raised lip on the face thereof around the periphery against said thin metal sheet to uniformly stretch said thin metal sheet.