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US3944684A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for depositing transparent, electrically conductive tin containing oxide coatings on a substrate

Assignee: RCA Corp
•
Filing: 1974-05-22
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Granted: 1976-03-16
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Expires: 1994-05-22
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Abstract

Abstract Certain volatile organotin compounds are vaporized in a heated carrier gas stream and brought into contact with a preheated substrate to be coated in an atmosphere containing oxygen. Indium oxide coatings may be doped with tin by vaporizing an organotin compound and an indium chelate of a β-diketone and bringing the vapors in contact with a heated substrate in an oxidizing atmosphere.

Inventors

  • 👤 James Kane
  • 👤 Hanspeter Schweizer

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 03:07
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/407; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/245; C03C17/2453

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 67 words
The process of depositing an oxide coating containing tin and indium on a substrate which comprises: a. vaporizing an indium chelate of 2,2,6,6-tetramethylheptane-3,5-dione, b. vaporizing an organotin compound having a vaporization temperature below about 200°C., c. heating said substrate to a temperature of from about 350°C. to about 550°C., and d. contacting said heated substrate with said indium vapor and said tin vapor in an oxidizing atmosphere.
Claim 2
Dependent Claim 67 words
The process of depositing an oxide coating containing tin and indium on a substrate which comprises: a. vaporizing an indium chelate of 2,2,6,6-tetramethylheptane-3,5-dione, b. vaporizing an organotin compound having a vaporization temperature below about 200°C., c. heating said substrate to a temperature of from about 350°C. to about 550°C., and d. contacting said heated substrate with said indium vapor and said tin vapor in an oxidizing atmosphere.
Claim 3
Dependent Claim 23 words
The process of claim 1 wherein said indium chelate is vaporized by heating at a temperature of from about 180° to about 250°C.
Claim 4
Dependent Claim 22 words
The process of claim 2 wherein said indium chelate is vaporized by heating at a temperature of between about 200° to 250°C.
Claim 5
Dependent Claim 34 words
The process of claim 1 wherein the organotin compound is selected from the group consisting of (R) 2 Sn--OOCR) 2 and (R 3 Sn) 2 O compounds wherein R is a lower alkyl group.
Claim 6
Dependent Claim 22 words
The process of claim 4 wherein said organotin compound is vaporized by heating to a temperature from about 80° to about 200°C.
Claim 7
Dependent Claim 25 words
The process of claim 1 wherein said organotin compound is selected from a group comprising dibutyl tin diacetate, bis(tri-n-propyl) tin oxide and bis(tri-n-butyl) tin oxide.
Claim 8
Dependent Claim 16 words
The process of claim 1 wherein said substrate is heated to a temperature between about 450°C.
Claim 9
Dependent Claim 12 words
The process of claim 1 wherein said oxidizing atmosphere contains water vapor.
Claim 10
Dependent Claim 81 words
The process of depositing transparent, uniform, electrically conductive tin doped indium oxide coatings on a substrate comprising: a. vaporizing an indium chelate of 2,2,6,6-tetramethylheptane-3,5-dione at a temperature of from about 180° to about 250°C., b. vaporizing dibutyl tin diacetate at a temperature of from about 80°C. to about 120°C., c. heating said substrate to a temperature of from about 350°C. to about 550°C., d. and contacting said heated substrate with said indium vapor and said tin vapor in an oxidizing atmosphere.
Claim 11
Dependent Claim 81 words
The process of depositing transparent, uniform, electrically conductive tin doped indium oxide coatings on a substrate comprising: a. vaporizing an indium chelate of 2,2,6,6-tetramethylheptane-3,5-dione at a temperature of from about 180° to about 250°C., b. vaporizing dibutyl tin diacetate at a temperature of from about 80°C. to about 120°C., c. heating said substrate to a temperature of from about 350°C. to about 550°C., d. and contacting said heated substrate with said indium vapor and said tin vapor in an oxidizing atmosphere.
Claim 12
Dependent Claim 12 words
The process of claim 9 wherein the oxidizing atmosphere contains water vapor.
Claim 13
Dependent Claim 37 words
The process of claim 9 wherein the substrate is a clear glass plate having a melting temperature above about 450°C. and said tin doped indium oxide film forms an electrode for use in a liquid crystal cell.

References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-03-16 1979-09-15 1980-03-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-03-16 1983-09-15 1984-03-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-03-16 1987-09-15 1988-03-16 $7700.00 Window Closed / Lapsed

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