US3925670A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electron beam irradiation of materials using rapidly pulsed cold cathodes
Assignee: RPC Industries
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Filing: 1974-01-16
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Granted: 1975-12-09
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Expires: 1994-01-16
Abstract
Abstract A cold cathode electron gun rapidly driven with high voltage pulses in an electric field configuration such that the emitted electrons are splayed over and directed into a target to be irradiated.
Inventors
- 👤 Sherman R Farrell
- 👤 Gary K Loda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 00:30
CPC Classifications
G; G21; G21K; G21K5/00; G21K5/04; H; H01; H01J; H01J33/00
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
197 words
In an electron irradiation processing apparatus, means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device at a rate greater than about 1 pulse per second, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means forming a high voltage bushing connecting said power supply to said cathode, said cathode including means forming a cathode housing having a generally elongate cylindrical configuration said housing having an elongate slit therein, means forming an elongate electron emissive edge projecting through said slit and directed toward a predetermined location, and means for adjusting the position of said edge relative to said housing; means forming an anode along the area at said location, means connecting said anode to said power supply, whereby electrons are caused to be emitted from said cathode as extended streams along the length of said cathode and splayed over the area of said anode without scanning, means for adjusting the distance of said cathode toward and away from said location, and means for passing a material to be treated through said predetermined location.
Claim 2
Dependent Claim
197 words
In an electron irradiation processing apparatus, means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device at a rate greater than about 1 pulse per second, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means forming a high voltage bushing connecting said power supply to said cathode, said cathode including means forming a cathode housing having a generally elongate cylindrical configuration said housing having an elongate slit therein, means forming an elongate electron emissive edge projecting through said slit and directed toward a predetermined location, and means for adjusting the position of said edge relative to said housing; means forming an anode along the area at said location, means connecting said anode to said power supply, whereby electrons are caused to be emitted from said cathode as extended streams along the length of said cathode and splayed over the area of said anode without scanning, means for adjusting the distance of said cathode toward and away from said location, and means for passing a material to be treated through said predetermined location.
Claim 3
Dependent Claim
43 words
An apparatus as in claim 1 further including means of forming a screen grid interposed between said cathode and said location, and means connecting said screen grid to said high voltage source for being pulsed therewith at a voltage lower than said cathode.
Claim 4
Dependent Claim
51 words
Apparatus as in claim 1 in which said high voltage power supply includes control means adapted to operate said supply to deliver an output having the following ranges, 100 to 500 kiloelectron volts, repetition rate 1 pulse per second to 10,000 pulses per second, pulse length 0.1 microsecond to 10 microseconds.
Claim 5
Dependent Claim
34 words
Apparatus as in Claim 1 further including an electron transmissive window disposed between said location and said cathode, said window being electrically conductive and connected as an anode for electrons emitted from said cathode.
Claim 6
Dependent Claim
21 words
Apparatus as in claim 1 further including means for adjusting the distance of said cathode toward and away from said location.
Claim 7
Independent Claim
181 words
A method for the electron irradiation of material utilizing a cold cathode electron gun disposed in electron irradiation processing apparatus of the type including means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means for forming a high voltage bushing connecting said power supply to said cathode, and further in which said cathode includes a cathode housing having a generally elongate cylindrical configuration in which is disposed means forming an elongate electron emissive edge projecting through a slit within said cylindrical housing and directed toward a predetermined location and means for adjusting the position of said edge relative to said housing comprising the steps of pulsing said cathode with pulses having the following characteristics, voltage strength 100 to 500 keV, pulse length greater than 0.1 microsecond, repetition rate 1 to 104 pulses per second, and passing a material to be treated by radiation through said predetermined location.
Claim 8
Independent Claim
181 words
A method for the electron irradiation of material utilizing a cold cathode electron gun disposed in electron irradiation processing apparatus of the type including means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means for forming a high voltage bushing connecting said power supply to said cathode, and further in which said cathode includes a cathode housing having a generally elongate cylindrical configuration in which is disposed means forming an elongate electron emissive edge projecting through a slit within said cylindrical housing and directed toward a predetermined location and means for adjusting the position of said edge relative to said housing comprising the steps of pulsing said cathode with pulses having the following characteristics, voltage strength 100 to 500 keV, pulse length greater than 0.1 microsecond, repetition rate 1 to 104 pulses per second, and passing a material to be treated by radiation through said predetermined location.
Claim 9
Dependent Claim
47 words
The method as in claim 6 in which said apparatus further includes a screen grid disposed between said cathode and said location and including the step of pulsing said screen grid in synchronism with said cathode at a potential 1 to 2 keV less than said cathode.
Claim 10
Dependent Claim
152 words
In electron irradiation processing apparatus for treatment of elongate material, means forming a vacuum chamber, means for passing material to be treated through said chamber and along a predetermined path therein, means forming a plurality of electron discharge devices disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge devices at a rate greater than about 1 pulse per second, each said electron discharge device including a cold cathode capable of plasma emission of electrons, means forming a cathode housing having a generally elongate cylindrical configuration and including means forming an elongate slit therein, means forming an elongate electron emissive edge projecting through said slit and directed towards said predetermined path, means for adjusting the position of said housing relative to said edge, and means forming a high voltage bushing connecting each of said housing forming means and said edge forming means to said power supply.
Claim 11
Dependent Claim
152 words
In electron irradiation processing apparatus for treatment of elongate material, means forming a vacuum chamber, means for passing material to be treated through said chamber and along a predetermined path therein, means forming a plurality of electron discharge devices disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge devices at a rate greater than about 1 pulse per second, each said electron discharge device including a cold cathode capable of plasma emission of electrons, means forming a cathode housing having a generally elongate cylindrical configuration and including means forming an elongate slit therein, means forming an elongate electron emissive edge projecting through said slit and directed towards said predetermined path, means for adjusting the position of said housing relative to said edge, and means forming a high voltage bushing connecting each of said housing forming means and said edge forming means to said power supply.
Claim 12
Dependent Claim
39 words
An apparatus as in claim 8 further including means of forming a screen grid surrounding said path, and means connecting said screen grid to said high voltage source for being pulsed therewith at a voltage lower than said cathode.
Claim 13
Dependent Claim
183 words
In an electron irradiation processing apparatus, means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device at a rate greater than about 1 pulse per second, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means forming a high voltage bushing connecting said power supply to said cathode, said cathode including means forming a cathode housing having a generally elongate cylindrical configuration said housing having an elongate slit therein, means forming an elongate electron emissive edge projecting through said slit and directed toward a predetermined location, and means for adjusting the position of said edge relative to said housing; means forming an anode along the area at said location, means connecting saiD anode to said power supply, whereby electrons are caused to be emitted from said cathode as extended streams along the length of said cathode and splayed over the area of said anode without scanning, and means for passing a material to be treated through said predetermined location.
Claim 14
Dependent Claim
183 words
In an electron irradiation processing apparatus, means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device at a rate greater than about 1 pulse per second, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means forming a high voltage bushing connecting said power supply to said cathode, said cathode including means forming a cathode housing having a generally elongate cylindrical configuration said housing having an elongate slit therein, means forming an elongate electron emissive edge projecting through said slit and directed toward a predetermined location, and means for adjusting the position of said edge relative to said housing; means forming an anode along the area at said location, means connecting saiD anode to said power supply, whereby electrons are caused to be emitted from said cathode as extended streams along the length of said cathode and splayed over the area of said anode without scanning, and means for passing a material to be treated through said predetermined location.
Claim 15
Independent Claim
168 words
A method for the electron irradiation of material utilizing a cold cathode electron gun disposed in electron irradiation processing apparatus of the type including means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means for forming a high voltage bushing connecting said power supply to said cathode, and further in which said cathode includes a cathode housing having a generally elongate cylindrical configuration in which is disposed means forming an elongate electron emissive edge projecting through a slit within said cylindrical housing and directed toward a predetermined location, comprising the steps of pulsing said cathode with pulses having the following characteristics, voltage strength 100 to 500 keV, pulse length greater than 0.1 microsecond, repetition rate 1 to 104 pulses per second, and passing a material to be treated by radiation through said predetermined location.
Claim 16
Independent Claim
168 words
A method for the electron irradiation of material utilizing a cold cathode electron gun disposed in electron irradiation processing apparatus of the type including means forming a vacuum chamber, means forming an electron discharge device disposed in said chamber, a high voltage power supply including means for pulsing said electron discharge device, a cold cathode capable of plasma emission of electrons disposed within said electron discharge device, means for forming a high voltage bushing connecting said power supply to said cathode, and further in which said cathode includes a cathode housing having a generally elongate cylindrical configuration in which is disposed means forming an elongate electron emissive edge projecting through a slit within said cylindrical housing and directed toward a predetermined location, comprising the steps of pulsing said cathode with pulses having the following characteristics, voltage strength 100 to 500 keV, pulse length greater than 0.1 microsecond, repetition rate 1 to 104 pulses per second, and passing a material to be treated by radiation through said predetermined location.
References Cited (Backward Citations)
US2924714A
Cited
US3109931A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-12-08 | 1979-06-09 | 1979-12-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-12-08 | 1983-06-09 | 1983-12-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-12-08 | 1987-06-09 | 1987-12-09 | $7700.00 | Window Closed / Lapsed |