US3923703A
Expired / Lapsed
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Process for preparing photosensitive polymer
Assignee: Mitsubishi Chemical Corp
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Filing: 1974-02-08
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Granted: 1975-12-02
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Expires: 1994-02-08
Abstract
Abstract wherein X and Y represent a hydrogen atom, halogen atom, cyano group, or nitro group, Ar represents an aryl group, n is 1 or 2; in the presence of a bicyclic amidine. A process for preparing a photosensitive polymer which comprises reacting a polymer having an active halogen with an Alpha , Beta -unsaturated carboxylic acid having the formula:
Inventors
- 👤 Hideo Fukutani
- 👤 Konoe Miura
- 👤 Chihiro Eguchi
- 👤 Yoshihiro Takahashi
- 👤 Kazuo Torige
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 06:18
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388; C; C08; C08F; C08F8/00; C08G; C08G65/00; C08G65/02; C08G65/32; C08G65/329; C08G65/331; C08G65/332; C08G65/3324; C08G65/3326; C08G65/333; C08G65/33396; C08G85/00
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
48 words
A PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER WHICH COMPRISES REACTING A. A POLYMER HAVING AN ACTIVE HALOGEN ATOM SELECTED FROM THE GROUP CONSISTING OF HALOGEN-CONTAINING POLYETHERS, COPOLYMERS OF HALOGEN-CONTAINING POLYETHERS WITH EPOXY COMPOUNDS, HALOGEN-CONTAINING VINYL POLYMERS AND ACRYL POLYMERS; B. WITH AN A,B-UNSATURATED CARBOXYLIC ACID HAVING THE FORMULA
Claim 2
Dependent Claim
48 words
A PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER WHICH COMPRISES REACTING A. A POLYMER HAVING AN ACTIVE HALOGEN ATOM SELECTED FROM THE GROUP CONSISTING OF HALOGEN-CONTAINING POLYETHERS, COPOLYMERS OF HALOGEN-CONTAINING POLYETHERS WITH EPOXY COMPOUNDS, HALOGEN-CONTAINING VINYL POLYMERS AND ACRYL POLYMERS; B. WITH AN A,B-UNSATURATED CARBOXYLIC ACID HAVING THE FORMULA
Claim 3
Dependent Claim
40 words
The process for preparing a photosensitive polymer of claim 1, wherein R1 is a C1 11 alkylene group or a lower alkyl substituted C1 11 alkylene group and R2 is a propylene group or a lower alkyl substituted propylene group.
Claim 4
Dependent Claim
36 words
The process for preparing a photosensitive polymer of claim 2, wherein R1 is a C1 11 alkylene group or a methyl C1 11 alkylene group; and R2 is a propylene group or a methyl propylene group.
Claim 5
Dependent Claim
33 words
The process for preparing a photosensitive polymer of claim 1 wherein 5 - 100 % of the active halogen atom in said polymer are replaced with the Alpha , Beta -unsaturated carboxylic radical.
Claim 6
Dependent Claim
31 words
The process for preparing a photosensitive polymer of claim 1, wherein the molar ratio of the bicyclic amidine to the Alpha , Beta -unsaturated carboxylic acid is from 0.1 to 10.
Claim 7
Dependent Claim
34 words
The process of claim 1, for preparing a photosensitive polymer of claim 1, wherein the molar ratio of the bicyclic amidine to the Alpha , Beta -unsaturated carboxylic acid is from 0.5 to 5.
Claim 8
Dependent Claim
41 words
The process for preparing a photosensitive polymer of claim 1, wherein said bicyclic amidine is added together with the Alpha , Beta -unsaturated carboxylic acid in a solution of the polymer having an active halogen atom in the aprotic polar solvent.
Claim 9
Dependent Claim
28 words
The process for preparing a photosensitive polymer of claim 1, wherein the reaction is conducted at a temperature of from room temperature to 100*C in a homogeneous condition.
Claim 10
Dependent Claim
40 words
The process for preparing a photosensitive polymer of claim 1 said bicyclic amidine and the Alpha , Beta -unsaturated carboxylic acid are dissolved in the solvent and the polymer having an active halogen atom is added in the resulting solution.
Claim 11
Dependent Claim
48 words
The process for preparing a photosensitive polymer of claim 1, wherein the bicyclic amidine is selected from the group consisting of 1,5-diazabicyclo (4.3.0) nonene-5; 1,5-diaza-3-methylbicyclo (4.3.0) nonene-5; 1,5-diazabicyclo (4.4.0) decene-5; 1,5-diaza-10-methylbicyclo (4.4.0) decene-5; 1,8-diazabicyclo (5.4.0) undecene-7; 1,9 -diazabicyclo (6.4.0) dodecene-8; 1, 10-diazabicyclo (7.4.0) tridecene-9; and 1,14-diazabicyclo (11.4.0) heptadecene-13;
References Cited (Backward Citations)
US3817876A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-12-01 | 1979-06-02 | 1979-12-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-12-01 | 1983-06-02 | 1983-12-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-12-01 | 1987-06-02 | 1987-12-02 | $7700.00 | Window Closed / Lapsed |