Backwetting coating for diazo microfilm
Abstract
Abstract A transfer resistant diazo photographic element is provided by employing an improved backwet composition, which when coated on the back of light sensitive diazo elements will inhibit offset or transfer of the sensitized coating from the front to a juxtaposed or contracting back of the element. Such transfer inhibition is vital when the element is stored under conditions causing contact of the front and back sides of the film, e.g., in tightly rolled condition. This transfer inhibition is accomplished by employing either selected solid, particulate, components in a standard back-wetting solution to form a back-wet slurry or selected cured thermosetting resins soluble in standard back-wetting solutions. The particulate components are small particle size inorganic compounds, for example, silica. An example of the thermo-setting resins that may be employed is ureaformaldehyde resin. The composition thus provided, has at least the dual functionality of preventing offset, and of controlling curl in the film or element.
Inventors
- 👤 Walter J Welch
Bibliographic Details
Claims Analysis
Total Claims: 4References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1978-10-27 | 1979-04-28 | 1979-10-28 | $2000.00 | Window Closed / Lapsed |
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