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US3914836A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for processing quartz crystal resonators

Assignee: United States Department of the Army
•
Filing: 1974-06-21
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Granted: 1975-10-28
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Expires: 1994-06-21
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Abstract

Abstract Precision quartz crystal resonators are processed in a high vacuum system in which all processing steps are performed in the same vacuum system without venting between stages. The processing steps include cleaning the resonator parts to remove contaminants from the surface, baking the resonator parts at temperatures up to 450*C to further remove adsorbed and absorbed contaminants, plating electrodes onto the crystal resonator, and sealing the resonator parts.

Inventors

  • 👤 Erich Hafner
  • 👤 John R Vig

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 08:17
CPC Classifications
H; H03; H03H; H03H3/00; H03H3/007; H03H3/02; Y; Y10; Y10S; Y10S29/00; Y10S29/044; Y10T; Y10T29/00; Y10T29/42

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 104 words
Method of processing precision quartz crystal resonators in a high vacuum system in which all processing steps are performed in the same vacuum system without venting between steps, and wherein said processing steps are each carried out in separate vacuum chambers, said chambers being interconnected to prevent exposure of the resonator parts to contaminating atmospheres during transfer between chambers, said processing steps including: a. cleaning the resonator parts to remove contaminants from the surface, b. baking the resonator parts at temperatures up to 450*C to further remove adsorbed and absorbed contaminants, c. depositing electrodes onto the crystal resonator, and d. sealing the resonator parts.
Claim 2
Dependent Claim 104 words
Method of processing precision quartz crystal resonators in a high vacuum system in which all processing steps are performed in the same vacuum system without venting between steps, and wherein said processing steps are each carried out in separate vacuum chambers, said chambers being interconnected to prevent exposure of the resonator parts to contaminating atmospheres during transfer between chambers, said processing steps including: a. cleaning the resonator parts to remove contaminants from the surface, b. baking the resonator parts at temperatures up to 450*C to further remove adsorbed and absorbed contaminants, c. depositing electrodes onto the crystal resonator, and d. sealing the resonator parts.
Claim 3
Dependent Claim 15 words
Method according to claim 1 wherein the cleaning in step (a) is by ion bombardment.
Claim 4
Dependent Claim 27 words
Method according to claim 1 wherein the cleaning in step (a) is by irradiation with ultraviolet light in the presence of a small partial pressure of oxygen.
Claim 5
Dependent Claim 16 words
Method according to claim 1 wherein the electrode deposition in step (c) is by Thermal evaporation.
Claim 6
Dependent Claim 27 words
Method according to claim 1 wherein the electrode deposition in step (c) is by simultaneous plating onto the two sides of the resonator at near equal rates.
Claim 7
Dependent Claim 38 words
Method according to claim 1 wherein in the electrode deposition in step (c), a loading and outgassing chamber is used for the changing and outgassing of the evaporation sources and the replenishing and outgassing of the electrode material.
Claim 8
Dependent Claim 23 words
Method according to claim 1 wherein the electrode deposition in step (c) is followed by ion bombardment for adjustment of the final frequency.
Claim 9
Dependent Claim 23 words
Method according to claim 1 wherein the electrode deposition in step (c) is followed by laser trimming for adjustment of the final frequency.
Claim 10
Dependent Claim 24 words
Method according to claim 1 wherein the sealing is carried out at pressures variable up to 5 tons and at temperatures up to 400*C.
Claim 11
Dependent Claim 17 words
Method according to claim 1 wherein the vacuum chambers are maintained clean by irradiation with ultraviolet light.
Claim 12
Dependent Claim 18 words
Method according to claim 1 wherein sealing is achieved by pressing two near atomically cleaned metal surfaces together.
Claim 13
Dependent Claim 20 words
Method according to claim 1 wherein the sealing is achieved with a metal O-ring between two near atomically clean surfaces.
Claim 14
Dependent Claim 17 words
Method according to claim 11 wherein heat is applied to the sealing surfaces during the sealing step.
Claim 15
Dependent Claim 17 words
Method according to claim 12 wherein heat is applied to the sealing surfaces during the sealing step.
Claim 16
Dependent Claim 70 words
Method according to claim 1 wherein sealing of the resonator parts in step (d) is accomplished by positioning a metal O-ring between a pair of rigorously cleaned, unmetallized aluminum surfaces of the resonator enclosure, said metal O-ring being selected from the group consisting of aluminum, iron, niobium, copper, and titanium and wherein a force up to five tons at a temperature up to 400*C is applied to effect the seal.

References Cited (Backward Citations)

US2586625A Cited
US2765765A Cited
US3048912A Cited
US3497944A Cited
US3597579A Cited
US3691720A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-10-27 1979-04-28 1979-10-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-10-27 1983-04-28 1983-10-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-10-27 1987-04-28 1987-10-28 $7700.00 Window Closed / Lapsed

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