Process of manufacturing an electrical resistive element

Claim 2

A PROCESS OF MANUFACTURING A ELECTRICAL RESISTIVE ELEMENT COMPRISED OF A CONDUCTIVE FILM COMPOSED OF ELEMENTAL CARBON DEPOSITED BY THERMAL DECOMPOSITION OF AHYDROCARBON GAS ON A SUBSTRATE, SAID SUBSTRATE COMPOSED OF AN INORGANIC DIELECTRIC SILICON-DIOXIDE CONTAINING CERAMIC, THE PROCESS COMPRISING: CLEANSING SELECT SURFACES OF SAID SUBSTRATE, AND SUBJECTING THE CLEANSED SURFACES TO THE ACTION OF A REACTION GAS CONTAINING A PYROLTICALLY DECOMPOSABLE FLURO-CARBON COMPOUND HAVING THE GENERAL FORMULA:

Claim 3

A method as defined in claim 1 wherein said fluoro-carbon compound is selected from the group consisting of perfluorohexane, perfluoroheptane, perfluoropentane, carbon tetrafluoride and mixtures thereof, and said reaction gas includes a carrier gas.

Claim 4

A method as defined in claim 2 wherein said fluoro-carbon compound is perfluorohexane and said cleansed surfaces are heated to a temperature in the range of about 900* to 1000* C. until elemental carbon is deposited thereon.

Claim 5

A method as defined in claim 2 wherein said carrier gas comprises N2.

Claim 6

A method as defined in claim 1 wherein said reaction gas includes a sufficient amount of a hydrocarbon selected from the group consisting of propanol-2, propane and heptane to deposit elemental carbon on etched areas of the substrate surfaces and protect the same from further etching.

Claim 7

A method as defined in claim 1 wherein said reaction gas is formed by passing a gaseous fluorocarbon through a liquid carbonizing agent.

Claim 8

A method as defined in claim 1 wherein said reaction gas is formed by passing a gaseous hydrocarbon through a liquid fluorocarbon.

Claim 9

A method as defined in claim 1 wherein said reaction gas is formed by vaporizing a fluorocarbon compound and a hydrocarbon compound and mixing said vaporized compounds, and controlling the composition of such reaction gas so that it initially contains a larger amount of the fluorocarbon compound.

Claim 10

A process of manufacturing an electrical resistive element comprised of a film of elemental carbon on a substrate composed of a silicon-dioxide containing ceramic, comprising: cleansing select surfaces of said substrate, forming a reaction gas containing a mixture of a pyrolytically decomposable fluoro-carbon compound selected from the group consisting of perfluorohexane, perfluoroheptane, perfluoropentane, carbon tetrafluoride and mixtures thereof, a hydrocarbon selected from the group consisting of propanol-2, propane, and heptane and nitrogen, and subjecting said cleansed surfaces to the action of said reaction gas under pressure-temperature conditions sufficient for a pyrolytic reaction to occur between pyrolysis products of said fluoro-carbon compound and said silicon-dioxide ceramic so as to form a silicon-fluoride layer on said surfaces and immediately thereafter pyrolytically deposit elemental carbon on said silicon-fluoride layer without exposing such layer to any oxidizing medium.

Claim 11

A process of manufacturing an electrical resistive element comprised of a film of elemental carbon on a substrate composed of a silicon-dioxide containing ceramic, comprising: cleansing select surfaces of said substrate, forming a reaction gas containing a mixture of a pyrolytically decomposable fluoro-carbon compound selected from the group consisting of perfluorohexane, perfluoroheptane, perfluoropentane, carbon tetrafluoride and mixtures thereof, a hydrocarbon selected from the group consisting of propanol-2, propane, and heptane and nitrogen, and subjecting said cleansed surfaces to the action of said reaction gas under pressure-temperature conditions sufficient for a pyrolytic reaction to occur between pyrolysis products of said fluoro-carbon compound and said silicon-dioxide ceramic so as to form a silicon-fluoride layer on said surfaces and immediately thereafter pyrolytically deposit elemental carbon on said silicon-fluoride layer without exposing such layer to any oxidizing medium.