US3902902A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming a photo-cross-linked insulator film
Assignee: Siemens AG
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Filing: 1974-03-25
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Granted: 1975-09-02
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Expires: 1994-03-25
Abstract
Abstract A single-phase, solid film-forming photo-cross-linkable resinous system comprised of a resin component containing allyl-ester groups and a resin component containing at least one N-maleic imide group with a ratio of the allyl double bond equivalent to the maleic imide double bond equivalent at least equal to 1. the resinous systems are especially useful as compositions for use in photoprinting applications, for example, as in production of printed circuits.
Inventors
- 👤 Wolfgang Kleeberg
- 👤 Roland Rubner
- 👤 Eberhard Kuehn
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 18:57
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
115 words
A METHOD OF FORMING A PHOTO-CROSS-LINKED INSULATOR FILM COMPRISING: APPLYING A LAYER OF A SINGLE-PHASE, SOLID FILM-FORMING, PHOTOCROSS-LINKABLE SYNTHETIC RESIN MATERIAL ONTO A SUBSTRATE, SAID RESIN MATERIAL COMPRISED OF A RESIN COMPONENT HAVING ALLYL ESTER GROUPS THEREIN AND A RESIN COMPONENT HAVING AT LEAST ONE N-MALEIC IMIDE GROUP THEREIN, WITH THE RATIO OF THE ALLYL DOUBLE BOND EQUIVALENT TO THE MALEIC IMIDE BOUBLE BOND EQUIVALENT BEING IN THE RANGE OF 1.5 TO 30: SELECTIVELY EXPOSING AREAS OF SAID LAYER TO ACTINIC LIGHT SO AS TO PHOTO-CROSS-LINK SAID RESIN MATERIAL AT THE EXPOSED AREAS OF SAID LAYER: AND SUBJECTING THE SELECTIVELY EXPOSED LAYER TO A SUITABLE SOLVENT FOR REMOVAL OF ONLY UNEXPOSED AREAS OF SAID LAYER.
Claim 2
Independent Claim
115 words
A METHOD OF FORMING A PHOTO-CROSS-LINKED INSULATOR FILM COMPRISING: APPLYING A LAYER OF A SINGLE-PHASE, SOLID FILM-FORMING, PHOTOCROSS-LINKABLE SYNTHETIC RESIN MATERIAL ONTO A SUBSTRATE, SAID RESIN MATERIAL COMPRISED OF A RESIN COMPONENT HAVING ALLYL ESTER GROUPS THEREIN AND A RESIN COMPONENT HAVING AT LEAST ONE N-MALEIC IMIDE GROUP THEREIN, WITH THE RATIO OF THE ALLYL DOUBLE BOND EQUIVALENT TO THE MALEIC IMIDE BOUBLE BOND EQUIVALENT BEING IN THE RANGE OF 1.5 TO 30: SELECTIVELY EXPOSING AREAS OF SAID LAYER TO ACTINIC LIGHT SO AS TO PHOTO-CROSS-LINK SAID RESIN MATERIAL AT THE EXPOSED AREAS OF SAID LAYER: AND SUBJECTING THE SELECTIVELY EXPOSED LAYER TO A SUITABLE SOLVENT FOR REMOVAL OF ONLY UNEXPOSED AREAS OF SAID LAYER.
Claim 3
Dependent Claim
37 words
A method of forming a photo-cross-linked insulator film as defined in claim 1 including subjecting the selectively exposed layer to a heat treatment for further cross-linking of the resin material in the exposed areas of such layer.
Claim 4
Dependent Claim
37 words
A method of forming a photo-cross-linked insulator film as defined in claim 1 including subjecting the selectively exposed layer to a dark reaction for further cross-linking of the resin material in the exposed areas of such layer.
References Cited (Backward Citations)
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US2722512A
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US3249656A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-09-01 | 1979-03-03 | 1979-09-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-09-01 | 1983-03-03 | 1983-09-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-09-01 | 1987-03-03 | 1987-09-02 | $7700.00 | Window Closed / Lapsed |