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US3902857A Expired / Lapsed US ⏱️ 0.0 years remaining

Thin film reactor

Assignee: Honeywell International Inc
•
Filing: 1973-08-13
•
Granted: 1975-09-02
•
Expires: 1993-08-13
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Abstract

Abstract A process is disclosed which comprises the steps of introducing a stream of the organic liquid onto a plurality of rotating reacting surfaces, rotating the reacting surfaces at a velocity such that the organic liquid is continuously formed into a thin film on each reacting surface and is continuously moved as a thin film towards the periphery of each reacting surface by centrifugal force, depositing over each thin film a substantially undiluted stream of a gaseous medium, reacting the organic liquid and gaseous medium on said rotating reacting surfaces, maintaining the pressure during reaction at subatmospheric levels, moving the resulting reaction products in a radially outward direction along each reacting surface and collecting said reaction product. An apparatus for carrying out such process is also disclosed.

Inventors

  • 👤 Mey John E Vander
  • 👤 Frank J Kremers

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 16:03
CPC Classifications
B; B01; B01J; B01J19/00; B01J19/24; B01J19/247; B01J10/00; B01J10/02

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 134 words
A REACTOR FOR REACTING A THIN FILM OF AN ORGANIC LIQUID WITH A GASEOUS MEDIUM COMPRISING: A REACTION CHAMBER VERTICAL PLANE AND TWO REACTING SURFACES A SUBSTANTIALLY VERTICAL PLANE AND TWO REACTING SURFACES INTERNAL OF SAID DISC AND FACING ONE ANOTHER: FIRST DEPOSITING MEANS TO DEPOSIT SAID ORGANIC LIQUID ON SAID REACTING SURFACES, ROTATING MEANS TO ROTATE SAID REACTING SURFACES AT A SPEED SUCH THAT SAID ORGANIC LIQUID IS CONTINUOUSLY FORMED INTO A THIN FILM ON EACH REACTING SURFACE AND IS CONTINUOUSLY MOVED TOWARDS THE PERIPHERY OF EACH REACTING SURFACE BY CENTRIFUGAL FORCE, SECOND DEPOSITING MEANS TO DEPOSIT A SUBSTANTIALLY UNDILUTED STREAM OF GASEOUS MEDIUM OVER WACH THIN FILM, COOLING MANS FOR COOLING EACH OF SAID REACTING SURFACES: MEANS TO MAINTAIN A SUBATMOSPHERIC PRESSURE BELOW ABOUT 100 MM HG IN SAID REACTION CHAMBER, AND
Claim 2
Dependent Claim 134 words
A REACTOR FOR REACTING A THIN FILM OF AN ORGANIC LIQUID WITH A GASEOUS MEDIUM COMPRISING: A REACTION CHAMBER VERTICAL PLANE AND TWO REACTING SURFACES A SUBSTANTIALLY VERTICAL PLANE AND TWO REACTING SURFACES INTERNAL OF SAID DISC AND FACING ONE ANOTHER: FIRST DEPOSITING MEANS TO DEPOSIT SAID ORGANIC LIQUID ON SAID REACTING SURFACES, ROTATING MEANS TO ROTATE SAID REACTING SURFACES AT A SPEED SUCH THAT SAID ORGANIC LIQUID IS CONTINUOUSLY FORMED INTO A THIN FILM ON EACH REACTING SURFACE AND IS CONTINUOUSLY MOVED TOWARDS THE PERIPHERY OF EACH REACTING SURFACE BY CENTRIFUGAL FORCE, SECOND DEPOSITING MEANS TO DEPOSIT A SUBSTANTIALLY UNDILUTED STREAM OF GASEOUS MEDIUM OVER WACH THIN FILM, COOLING MANS FOR COOLING EACH OF SAID REACTING SURFACES: MEANS TO MAINTAIN A SUBATMOSPHERIC PRESSURE BELOW ABOUT 100 MM HG IN SAID REACTION CHAMBER, AND
Claim 3
Dependent Claim 16 words
A reactor as claimed in claim 1 wherein said cooling means are internal of said disc.
Claim 4
Dependent Claim 18 words
A reactor as claimed in claim 1 including separating means for separating unreacted gas from liquid reaction products.
Claim 5
Dependent Claim 19 words
A reactor as claimed in claim 3 including means to recycle said liquid reaction products to said reacting surfaces.
Claim 6
Dependent Claim 44 words
A reactor as claimed in claim 1 wherein said first depositing means comprises first inlet means located adjacent to the center of said rotatable reacting surfaces and wherein said second depositing means comprises second inlet means spaced radially outward from said first inlet means.
Claim 7
Dependent Claim 22 words
A reactor as claimed in claim 5 wherein said removing means includes collection means spaced radially outward from said second inlet means.

References Cited (Backward Citations)

US2703275A Cited
US3457047A Cited
US3168289A Cited
US3427342A Cited
US3347620A Cited
US3473896A Cited
US3503712A Cited
US3529936A Cited
US3787481A Cited
US3607087A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-09-01 1979-03-03 1979-09-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-09-01 1983-03-03 1983-09-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-09-01 1987-03-03 1987-09-02 $7700.00 Window Closed / Lapsed

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