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US3902133A Expired / Lapsed US ⏱️ 0.0 years remaining

Monolithic source for integrated optics

Assignee: Texas Instruments Inc
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Filing: 1973-09-24
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Granted: 1975-08-26
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Expires: 1993-09-24
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Abstract

Abstract The disclosure relates to a semiconductor diode laser and a thin film optical waveguide, wherein the output of the laser is coupled into the waveguide in a monolithic device structure. A transfer of power from the laser to the waveguide is achieved through an evanescent field coupling. To accomplish this, a large optical cavity injection laser including internal layers forming the optical cavity, to which radiation is confined because of index of refraction discontinuities, is provided as a mesa on a substrate wherein the substrate is made of n-type gallium arsenide. Two layers of n-type aluminum gallium arsenide are formed on the substrate followed by an n-type aluminum gallium arsenide layer included in the mesa which forms the laser structure. The uppermost n-type aluminum gallium arsenide layer on the substrate is the waveguide and has a lower aluminum to gallium ratio than the aluminum gallium arsenide layers respectively included in the substrate and the mesa laser structure on opposite sides thereof. An evanescent field coupling exists between the lower layer of the mesa laser structure and the waveguide layer of the substrate, the strength of which is controlled by the thickness of the n-type aluminum gallium arsenide layer in the mesa laser structure. The waveguide is transparent to the gallium arsenide laser radiation because of the larger band gap of the material thereof. In a typical situation, using 300 microns as a cavity length and other typical laser parameters, about 10 percent of the laser power is coupled into the waveguide for a thickness of the n-type aluminum gallium arsenide lower layer of the mesa laser structure of one micron. The laser cavity is formed by a further n-type gallium arsenide layer over which is a p-type gallium arsenide layer. A p-type aluminum gallium arsenide layer is over the p-type gallium arsenide layer and a further p-type gallium arsenide layer is above the p-type aluminum gallium arsenide layer to complete the mesa structure. The facets on the end faces of the laser are parallel and preferably covered with a highly reflecting nonconducting coating in the case of a transmitter where the laser is an oscillator. In the case of a repeater, where the laser is an amplifier, the end faces should have very low reflectivity. In this case they need not even be parallel.

Inventors

  • 👤 Roderick Kent Watts

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 04:32
CPC Classifications
H; H04; H04B; H04B10/00; H04B10/50; H01; H01S; H01S5/00; H01S5/02; H01S5/026; H01S5/10; H01S5/1028; H01S5/1032; H01S5/028; H01S5/0287; Y; Y10; Y10S; Y10S148/00; Y10S148/026; Y10S148/065; Y10S148/067; Y10S148/107; Y10S148/115

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 204 words
A monolithic semiconductor structure comprising: a semiconductor substrate, first and second layers of semiconductor material, said first layer of semiconductor material being disposed in intimate contact with the surface of said semiconductor substrate and said second layer of semiconductor material being disposed atop said first layer of semiconductor material in intimate contact therewith, a semiconductor laser mounted on said second layer of semiconductor material and including a base layer of semiconductor material disposed in intimate contact with said second layer of semiconductor material and third and fourth layers of semiconductor material of opposite conductivity types disposed on said base layer of semiconductor material, said third and fourth layers of semiconductor material defining a pn junction therebetween and comprising the laser cavity of said semiconductor laser, said first and base layers of semiconductor material having substantially the same index of refraction and said second layer of semiconductor material sandwiched therebetween having a higher index of refraction relative to the index of refraction of said first and base layers of semiconductor material and comprising a semiconductor waveguide, and said semiconductor laser being optically coupled to said semiconductor waveguide by evanescent fields through said base layer for transferring radiation from said semiconductor laser into said semiconductor waveguide.
Claim 2
Dependent Claim 204 words
A monolithic semiconductor structure comprising: a semiconductor substrate, first and second layers of semiconductor material, said first layer of semiconductor material being disposed in intimate contact with the surface of said semiconductor substrate and said second layer of semiconductor material being disposed atop said first layer of semiconductor material in intimate contact therewith, a semiconductor laser mounted on said second layer of semiconductor material and including a base layer of semiconductor material disposed in intimate contact with said second layer of semiconductor material and third and fourth layers of semiconductor material of opposite conductivity types disposed on said base layer of semiconductor material, said third and fourth layers of semiconductor material defining a pn junction therebetween and comprising the laser cavity of said semiconductor laser, said first and base layers of semiconductor material having substantially the same index of refraction and said second layer of semiconductor material sandwiched therebetween having a higher index of refraction relative to the index of refraction of said first and base layers of semiconductor material and comprising a semiconductor waveguide, and said semiconductor laser being optically coupled to said semiconductor waveguide by evanescent fields through said base layer for transferring radiation from said semiconductor laser into said semiconductor waveguide.
Claim 3
Dependent Claim 23 words
A monolithic semiconductor structure as set forth in claim 1, wherein said semiconductor laser is formed as a mesa on said semiconductor waveguide.
Claim 4
Dependent Claim 57 words
A monolithic semiconductor structure as set forth in claim 1, wherein said semiconductor substrate is formed of gallium arsenide, said first, second, and base layers of semiconductor material being formed of gallium aluminum arsenide, and said third and fourth layers of semiconductor material included in said semiconductor laser being formed of gallium arsenide of opposite conductivity types.
Claim 5
Dependent Claim 27 words
A monolithic semiconductor structure as set forth in claim 1, wherein said first, second, and base layers of semiconductor material are all of the same conductivity type.
Claim 6
Dependent Claim 294 words
A monolithic semiconductor structure comprising: a semiconductor substrate of n-type gallium arsenide, a first layer of n-type gallium aluminum arsenide disposed in intimate contact with said substrate, a second layer of n-type gallium aluminum arsenide disposed atop said first layer of n-type gallium aluminum arsenide in intimate contact therewith, a semiconductor laser mounted on said second layer of n-type gallium aluminum arsenide and including a base layer of n-type gallium aluminum arsenide in intimate contact with said second layer of n-type gallium aluminum arsenide, and a pair of laser cavity-defining layers of gallium arsenide of opposiTe conductivity types disposed on said base layer of n-type gallium aluminum arsenide with the n-type gallium arsenide laser cavity-defining layer in intimate contact with said base layer of n-type gallium aluminum arsenide and the p-type gallium arsenide laser cavity-defining layer being disposed in intimate contact with the opposite surface of said n-type gallium arsenide laser cavity-defining layer to define a p-n junction therewith, and a layer of p-type gallium aluminum arsenide disposed atop said p-type gallium arsenide laser cavity-defining layer, said second n-type gallium aluminum arsenide layer having a lower aluminum to gallium ratio than said first layer and said base layer of n-type gallium aluminum arsenide between which it is disposed, the index of refraction of said second layer of n-type gallium aluminum arsenide being higher than the indices of refraction of said first layer and said base layer of n-type gallium aluminum arsenide, said second n-type gallium aluminum arsenide layer serving as a semiconductor waveguide, and said semiconductor laser being optically coupled to said semiconductor waveguide by evanescent fields through said base layer of n-type gallium aluminum arsenide in intimate contact with said semiconductor waveguide for transferring radiation from said semiconductor laser into said semiconductor waveguide.
Claim 7
Dependent Claim 294 words
A monolithic semiconductor structure comprising: a semiconductor substrate of n-type gallium arsenide, a first layer of n-type gallium aluminum arsenide disposed in intimate contact with said substrate, a second layer of n-type gallium aluminum arsenide disposed atop said first layer of n-type gallium aluminum arsenide in intimate contact therewith, a semiconductor laser mounted on said second layer of n-type gallium aluminum arsenide and including a base layer of n-type gallium aluminum arsenide in intimate contact with said second layer of n-type gallium aluminum arsenide, and a pair of laser cavity-defining layers of gallium arsenide of opposiTe conductivity types disposed on said base layer of n-type gallium aluminum arsenide with the n-type gallium arsenide laser cavity-defining layer in intimate contact with said base layer of n-type gallium aluminum arsenide and the p-type gallium arsenide laser cavity-defining layer being disposed in intimate contact with the opposite surface of said n-type gallium arsenide laser cavity-defining layer to define a p-n junction therewith, and a layer of p-type gallium aluminum arsenide disposed atop said p-type gallium arsenide laser cavity-defining layer, said second n-type gallium aluminum arsenide layer having a lower aluminum to gallium ratio than said first layer and said base layer of n-type gallium aluminum arsenide between which it is disposed, the index of refraction of said second layer of n-type gallium aluminum arsenide being higher than the indices of refraction of said first layer and said base layer of n-type gallium aluminum arsenide, said second n-type gallium aluminum arsenide layer serving as a semiconductor waveguide, and said semiconductor laser being optically coupled to said semiconductor waveguide by evanescent fields through said base layer of n-type gallium aluminum arsenide in intimate contact with said semiconductor waveguide for transferring radiation from said semiconductor laser into said semiconductor waveguide.

References Cited (Backward Citations)

US3340479A Cited
US3351410A Cited
US3790902A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-08-25 1979-02-24 1979-08-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-08-25 1983-02-24 1983-08-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-08-25 1987-02-24 1987-08-26 $7700.00 Window Closed / Lapsed

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