US3900660A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Manufacture of silicon metal from a mixture of chlorosilanes
Assignee: Advanced Silicon Materials LLC
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Filing: 1974-01-11
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Granted: 1975-08-19
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Expires: 1994-01-11
Abstract
Abstract A high yield process for making polycrystalline silicon metal suitable for semiconductor usage which involves vapor phase decomposition of a mixture of dichlorosilane and trichlorosilane.
Inventors
- 👤 Howard B Bradley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 20:48
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/24; Y; Y10; Y10S; Y10S148/00; Y10S148/025; Y10S148/122
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
108 words
THE PROCESS FOR MAKING POLYCRYSTALLINE SILICON METAL OF SEMICONDUCTOR QUALITY WHICH COMPRISES PROVIDING A GASEOUS CHLOROSILANE MIXTURE OF DICHLOROSILANE AND TRICHLOROSILANE IN COMBINATION WITH HYDROGEN GAS IN A REACTOR CONTAINING A HOT DEPOSITION SURFACE AT A TEMPERATURE OF ABOUT 850*C. TO ABOUT 1.300*C., CAUSING DECOMPOSITION OF DICHLOROSILANE AND TRICHLOROSILANE IN SAID REACTOR AND DEPOSITING SUCH AS POLYCRYSTALLINE METAL ON SAID HOT DEPOSITION SURFACE, AND THE AMOUNT OF DICHLORSILANE IN SAID MIXTURE COMPRISES FROM ABOUT 5 MOLE PERCENT TO ABOUT 70 MOLE PERCENT THEREOF AND THE CHLOROSILANE MIXTURE COMPRISES 5 PERCENT TO 30 PERCENT OF THE MOLES OF THE COMBINATION OF SAID MIXTURE AND HYDROGEN PROVIDED IN SAID REACTOR.
Claim 2
Dependent Claim
108 words
THE PROCESS FOR MAKING POLYCRYSTALLINE SILICON METAL OF SEMICONDUCTOR QUALITY WHICH COMPRISES PROVIDING A GASEOUS CHLOROSILANE MIXTURE OF DICHLOROSILANE AND TRICHLOROSILANE IN COMBINATION WITH HYDROGEN GAS IN A REACTOR CONTAINING A HOT DEPOSITION SURFACE AT A TEMPERATURE OF ABOUT 850*C. TO ABOUT 1.300*C., CAUSING DECOMPOSITION OF DICHLOROSILANE AND TRICHLOROSILANE IN SAID REACTOR AND DEPOSITING SUCH AS POLYCRYSTALLINE METAL ON SAID HOT DEPOSITION SURFACE, AND THE AMOUNT OF DICHLORSILANE IN SAID MIXTURE COMPRISES FROM ABOUT 5 MOLE PERCENT TO ABOUT 70 MOLE PERCENT THEREOF AND THE CHLOROSILANE MIXTURE COMPRISES 5 PERCENT TO 30 PERCENT OF THE MOLES OF THE COMBINATION OF SAID MIXTURE AND HYDROGEN PROVIDED IN SAID REACTOR.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-08-18 | 1979-02-17 | 1979-08-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-08-18 | 1983-02-17 | 1983-08-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-08-18 | 1987-02-17 | 1987-08-19 | $7700.00 | Window Closed / Lapsed |