← Back to Patent Explorer
US3900325A Expired / Lapsed US ⏱️ 0.0 years remaining

Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide

Assignee: Shipley Co Inc
•
Filing: 1972-11-06
•
Granted: 1975-08-19
•
Expires: 1992-11-06
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract This invention is for a positive working, light sensitive composition useful for diverse applications such as metal plating and etching of metal, ceramics and the like, in a pattern, for example, in chemical milling or in the manufacture of printed circuit boards. Light sensitive compositions of the invention comprise (1) a major portion of a resin system having as principal ingredients, a carboxyl type acrylic resin and an acrylamide as a modifier and (2) a minor portion of at least one positive working, light sensitive diazo compound. By use of the acrylamide modifier in combination with the acrylic resin, there is provided a thick resist coating having improved photochemical properties and improved chemical resistance, especially to acid.

Inventors

  • 👤 Carl W Christensen
  • 👤 Calvin M Isaacson

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 05:47
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 170 words
A POSITIVE WORKING PHOTORESIST COMPOSITION COMPRISING AN ORTHO QUINONE DIAZIDE SULFONYL ESTER LIGHT SENSITIVE COMPOUND, AN ACRYLIC TERPOLYMER RESIN WHEREIN ONE OF THE MONOMERS OF THE TERPOLYMER IS SELECTED FROM THE GROUP CONSISTING OF METHYL ACRYLATE, ETHYL ETHYLATE, AND PROPYL ACRYLATE, WHEREIN A SECOND MONOMER OF THE TERPOLYMER IS SELECTED FROM THE GROUP CONSISTING OF P-METHYL STYRENE, P-CHLOROSTYRENE, PETHYL STYRENE, AND STYRENE AND THE THIRD MONOMER OF THE TERPOLYMER IS SELECTED FROM THE GROUP CONSISTING OF ACRYLIC ACID, METHACRYLIC ACID, AND MALEIC ACID, WHEREIN THE WEIGHT PERCENT OF SAID THIRD MONOMER IS 3-15% BY WEIGHT AS BASED ON THE TOTAL WEIGHT OF THE MONOMERS OF SAID ACRYLIC TERPOLYMER RESIN, AND AN N-3-OXOHYDROCARBON SUBSTITUTED ACRYLAMIDE, THE RATIO OF SAID ACRYLIC RESIN TO SAID ACRYLAMIDE BEING BETWEEN 100:1 PARTS ACRYLIC RESIN TO ACRYLAMIDE TO 1:2 PARTS ACRYLIC RESIN TO ACRYLAMIDE ON A WEIGHT BASIS, AND SAID LIGHT SENSITIVE COMPOUND COMPRISING UP TO 40% BY WEIGHT OF THE PHOTORESIST COMPOSITION ON A DRY SOLIDS BASIS, AND SAID ACRYLAMIDE BEING REPRESENTED BY THE FORMULA:
Claim 2
Dependent Claim 170 words
A POSITIVE WORKING PHOTORESIST COMPOSITION COMPRISING AN ORTHO QUINONE DIAZIDE SULFONYL ESTER LIGHT SENSITIVE COMPOUND, AN ACRYLIC TERPOLYMER RESIN WHEREIN ONE OF THE MONOMERS OF THE TERPOLYMER IS SELECTED FROM THE GROUP CONSISTING OF METHYL ACRYLATE, ETHYL ETHYLATE, AND PROPYL ACRYLATE, WHEREIN A SECOND MONOMER OF THE TERPOLYMER IS SELECTED FROM THE GROUP CONSISTING OF P-METHYL STYRENE, P-CHLOROSTYRENE, PETHYL STYRENE, AND STYRENE AND THE THIRD MONOMER OF THE TERPOLYMER IS SELECTED FROM THE GROUP CONSISTING OF ACRYLIC ACID, METHACRYLIC ACID, AND MALEIC ACID, WHEREIN THE WEIGHT PERCENT OF SAID THIRD MONOMER IS 3-15% BY WEIGHT AS BASED ON THE TOTAL WEIGHT OF THE MONOMERS OF SAID ACRYLIC TERPOLYMER RESIN, AND AN N-3-OXOHYDROCARBON SUBSTITUTED ACRYLAMIDE, THE RATIO OF SAID ACRYLIC RESIN TO SAID ACRYLAMIDE BEING BETWEEN 100:1 PARTS ACRYLIC RESIN TO ACRYLAMIDE TO 1:2 PARTS ACRYLIC RESIN TO ACRYLAMIDE ON A WEIGHT BASIS, AND SAID LIGHT SENSITIVE COMPOUND COMPRISING UP TO 40% BY WEIGHT OF THE PHOTORESIST COMPOSITION ON A DRY SOLIDS BASIS, AND SAID ACRYLAMIDE BEING REPRESENTED BY THE FORMULA:
Claim 3
Dependent Claim 21 words
The composition of claim 1 where the ratio of the acrylic terpolymer resin to the acrylamide varies between 50:1 and 1:1.
Claim 4
Dependent Claim 21 words
The composition of claim 1 where the ratio of the acrylic terpolymer resin to the acrylamide varies between 25:1 and 10:1.
Claim 5
Dependent Claim 26 words
The composition of claim 1 where the light sensitive therefor comprises from 2 to 20% by weight of the photoresist composition on a dry solids basis.
Claim 6
Dependent Claim 26 words
The composition of claim 1 where the light sensitive therefor comprises from 8 to 12% by weight of the photoresist composition on a dry solids basis.
Claim 7
Dependent Claim 9 words
The composition of claim 1 where R is methyl.
Claim 8
Dependent Claim 14 words
The composition of claim 1 where R is methyl and R'''' is 1,1-dimethyl ethylene.
Claim 9
Dependent Claim 29 words
The composition of claim 1 including a novolak resin of the phenol-formaldehyde type present in an amount of from 25 to 75 % by weight of said resin system.
Claim 10
Dependent Claim 25 words
The composition of claim 8 where the novolak resin is present in an amount of from 40 to 60% by weight of said resin system.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-08-18 1979-02-17 1979-08-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-08-18 1983-02-17 1983-08-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-08-18 1987-02-17 1987-08-19 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag