← Back to Patent Explorer
US3892840A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of producing an oxygen containing silicon compound

Assignee: Danfoss AS
•
Filing: 1974-01-10
•
Granted: 1975-07-01
•
Expires: 1994-01-10
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract The invention relates to a method for producing an oxygen containing silicon compound free of silicon dioxide. This is accomplished by keeping the partial pressure of the oxygen at the reaction temperature lower than 10 16 atmospheres. In one embodiment the atmosphere consists of nitrogen and a small amount of oxygen in some form such as carbon monoxide. In other embodiments nitrogen may be replaced by hydrogen or an inert gas.

Inventors

  • 👤 Jorgen Abildtrup

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 04:10
CPC Classifications
C; C01; C01B; C01B21/00; C01B21/082; C01B21/0821; C01B21/0823; C04; C04B; C04B35/00; C04B35/515; C04B35/56; C04B35/565; C04B35/573; C04B35/58; C04B35/584; C04B35/591

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 93 words
A METHOD OF PRODUCING SHAPED ELEMENTS OF SILICON OXYNITRIDE ESSENTIALLY FREE OF SIO2, WHICH COMPRISES FORMING A SILICAFREE POWDER COMPACT CONSISTING ESSENTIALLY OF POWDERED SILICON AND HEATING THE COMPACT AT A TEMPERATURE IN THE RANGE 1200*C TO 1600*C AND UNDER A GASEOUS ATMOSPHERE CONSISTING ESSENTIALLY OF NITROGEN AND FREE OXYGEN, FOR A PERIOD OF FROM 1-3 HOURS, WHERE THE GASEOUS ATMOSPHERE CONTAINS AN AMOUNT OF FREE OXYGEN GAS SUFFICIENT TO MAINTAIN THE PARTIAL PRESSURE OF OXYGEN IN THE REACTION ZONE DURING THE REACTION PERIOD LOWER THAN 10**-16 ATMOSPHERES BUT GREATER THAN 10**26 ATMOSPHERES.
Claim 2
Independent Claim 93 words
A METHOD OF PRODUCING SHAPED ELEMENTS OF SILICON OXYNITRIDE ESSENTIALLY FREE OF SIO2, WHICH COMPRISES FORMING A SILICAFREE POWDER COMPACT CONSISTING ESSENTIALLY OF POWDERED SILICON AND HEATING THE COMPACT AT A TEMPERATURE IN THE RANGE 1200*C TO 1600*C AND UNDER A GASEOUS ATMOSPHERE CONSISTING ESSENTIALLY OF NITROGEN AND FREE OXYGEN, FOR A PERIOD OF FROM 1-3 HOURS, WHERE THE GASEOUS ATMOSPHERE CONTAINS AN AMOUNT OF FREE OXYGEN GAS SUFFICIENT TO MAINTAIN THE PARTIAL PRESSURE OF OXYGEN IN THE REACTION ZONE DURING THE REACTION PERIOD LOWER THAN 10**-16 ATMOSPHERES BUT GREATER THAN 10**26 ATMOSPHERES.
Claim 3
Dependent Claim 50 words
A method according to claim 1, wherein the compact is heated at a temperature in the range 1400*C to 1500*C in a gaseous atmosphere consisting essentially of nitrogen and free oxygen, wherein the partial pressure of said free oxygen is below 10 19 atmospheres but greater than 10 26 atmospheres.

References Cited (Backward Citations)

US2968530A Cited
US3356513A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-06-30 1978-12-30 1979-07-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-06-30 1982-12-30 1983-07-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-06-30 1986-12-30 1987-07-01 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag