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US3892827A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for precipitating a layer of semiconductor material from a gaseous compound of said semiconductor material

Assignee: Siemens AG
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Filing: 1969-10-29
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Granted: 1975-07-01
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Expires: 1989-10-29
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Abstract

Abstract Process of producing a hollow semiconductor body, particularly of silicon, by precipitating through a reaction with a gaseous semiconductor compound on an electrically heated mandrel, the improvement comprising coating the mandrel with soot prior to precipitating the semiconductor material.

Inventors

  • 👤 Wolfgang Keller
  • 👤 Arno Kersting
  • 👤 Konrad Reuschel

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 23:41
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/01

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 89 words
METHOD OF PRODUCING A TUBLAR SILICON BODY WHEREIN THE OUTER SURFACE OF A HOLLOW CYLINDRICAL BODY IS TREATED WITH SOOT AND HEATED BY ELECTRIC CURRENT, IN A FLOWING REACTION GAS OF A SILICON HALOGEN COMPOUND (SIHCI3) AND HYDROGEN, TO A TEMPERATURE RANGING BETWEEN 1050*-1250*C UNTIL THE SILICON LAYER PRECIPITATED ON THE OUTER SURFACE OF THE CARRIER BODY ATTAINS THE WALL THICKNESS OF THE TUBE BEING PRODUCED, COOLING THE CARRIER AND THE SILICON BODY AND PULLING APART THE TUBULAR SILICON LAYER AND THE CARRIER BODY, WITHOUT DAMAGING SAID SILICON LAYER.
Claim 2
Dependent Claim 89 words
METHOD OF PRODUCING A TUBLAR SILICON BODY WHEREIN THE OUTER SURFACE OF A HOLLOW CYLINDRICAL BODY IS TREATED WITH SOOT AND HEATED BY ELECTRIC CURRENT, IN A FLOWING REACTION GAS OF A SILICON HALOGEN COMPOUND (SIHCI3) AND HYDROGEN, TO A TEMPERATURE RANGING BETWEEN 1050*-1250*C UNTIL THE SILICON LAYER PRECIPITATED ON THE OUTER SURFACE OF THE CARRIER BODY ATTAINS THE WALL THICKNESS OF THE TUBE BEING PRODUCED, COOLING THE CARRIER AND THE SILICON BODY AND PULLING APART THE TUBULAR SILICON LAYER AND THE CARRIER BODY, WITHOUT DAMAGING SAID SILICON LAYER.

References Cited (Backward Citations)

US2880117A Cited
US2974388A Cited
US3014791A Cited
US3170859A Cited
US3139363A Cited
US3178308A Cited
US3396220A Cited
US3367826A Cited
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US3609829A Cited
US3534131A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-06-30 1978-12-30 1979-07-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-06-30 1982-12-30 1983-07-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-06-30 1986-12-30 1987-07-01 $7700.00 Window Closed / Lapsed

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