US3877183A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of polishing semiconductor surfaces
Assignee: Wacker Chemie AG
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Filing: 1972-08-28
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Granted: 1975-04-15
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Expires: 1992-08-28
Abstract
Abstract Method of polishing semiconductor surfaces with mechanical polishing agents, in which said polishing agents are precipitated silicates and/or silicofluorides.
Inventors
- 👤 Helmut Deckert
- 👤 Herbert Jacob
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 12:07
CPC Classifications
H; H10; H10P; H10P90/00; H10P90/12; H10P90/129
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
143 words
PROCESS OF FINISH POLISHING THE SURFACE OF A SEMICONDUCTOR WHICH COMPRISES APPLYING TO SAID SURFACE A POLISHING AGENT CONSISTING ESSENTIALLY OF A FINELY DIVIDED, FRESHLY PRECIPITATED DIFFICULTLY SOULBLE MEMBER OF THE GROUP CONSISTING OF A METAL SILICATE AND A METAL FLUORILICATE HAVING A PARTICLE SIZE RANGE FROM ABOUT 20 TO ABOUT 60 UM, SAID METAL SILICATE BEING PRECIPITATED FROMAN AQUEOUS SOLUTION OF AN ALKALI SILICATE BY ADDITION OF A WATER SOLUBLE COMPOUND OF A METAL OF THE GROUP CONSISTING OF ZIRCONIUM, IRON, LEAD, NICKEL, COBALT, MAGNESIUM, CALCIUM, STRONTIUM, BARIUM, ZINC AND ALUMINUM, AND SAID METAL FLUOSILICATE ACID OR AN ALKALI FLUOSILICATE BY ADDITION OF A WATER SOLUBLE COMPOUND OF A METAL OF THE GROUP CONSISTING OF SODIUM, POTASSIUM, CALCIUM,BARIUM AND ALUMINUM,SAID FRESHLY PRECIPITATED DIFFICULTLY SOLUBLE METAL SILICATE OR FLUORICATE BEING IN SUSPENSION IN THE AQUEOUS REACTION MEDIUM IN WHICH IS FORMED BY PRECIPITATION.
Claim 2
Dependent Claim
143 words
PROCESS OF FINISH POLISHING THE SURFACE OF A SEMICONDUCTOR WHICH COMPRISES APPLYING TO SAID SURFACE A POLISHING AGENT CONSISTING ESSENTIALLY OF A FINELY DIVIDED, FRESHLY PRECIPITATED DIFFICULTLY SOULBLE MEMBER OF THE GROUP CONSISTING OF A METAL SILICATE AND A METAL FLUORILICATE HAVING A PARTICLE SIZE RANGE FROM ABOUT 20 TO ABOUT 60 UM, SAID METAL SILICATE BEING PRECIPITATED FROMAN AQUEOUS SOLUTION OF AN ALKALI SILICATE BY ADDITION OF A WATER SOLUBLE COMPOUND OF A METAL OF THE GROUP CONSISTING OF ZIRCONIUM, IRON, LEAD, NICKEL, COBALT, MAGNESIUM, CALCIUM, STRONTIUM, BARIUM, ZINC AND ALUMINUM, AND SAID METAL FLUOSILICATE ACID OR AN ALKALI FLUOSILICATE BY ADDITION OF A WATER SOLUBLE COMPOUND OF A METAL OF THE GROUP CONSISTING OF SODIUM, POTASSIUM, CALCIUM,BARIUM AND ALUMINUM,SAID FRESHLY PRECIPITATED DIFFICULTLY SOLUBLE METAL SILICATE OR FLUORICATE BEING IN SUSPENSION IN THE AQUEOUS REACTION MEDIUM IN WHICH IS FORMED BY PRECIPITATION.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-04-14 | 1978-10-14 | 1979-04-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-04-14 | 1982-10-14 | 1983-04-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-04-14 | 1986-10-14 | 1987-04-15 | $7700.00 | Window Closed / Lapsed |