Abstract A method of depositing a metal on a surface of a substrate is disclosed. A suitable colloidal sensitizing solution, comprising insoluble hydrous oxide particles, selected from among solutions revealed in application Ser. No. 8,022, filed Feb. 2, 1970, is applied to a surface of a substrate. The sensitized substrate surface is then treated with a suitable redox agent to delineate a pattern capable of reducing an activating metal ion to an activating metal. Alternatively, a positive colloidal sensitizing solution, i.e., a solution comprising ions capable of reducing an activating metal ion to an activating metal is applied to the surface and the sensitized surface is then treated with an activating metal ion containing solution to deposit an activating metal pattern thereon. Alternatively, a colloidal activating metal solution is applied to the surface and the surface is then treated with a solution comprising an ion capable of reducing an activating metal ion to deposit an activating metal pattern thereon.
A METHOD OF DEPOSITING A METAL PATTERN ON A SURFACE OF A SUBSTRATE, WHICH COMPRISES: A. SENSITIZING THE SURFACE WITH A POSITIVE COLLOIDAL SENSITIZING SOL COMPRISING INSOLUBLE HYDROUS OXIDE PARTICLES OF AN ELEMENT SELECTED FROM THE GROUP CONSISTING OF SN, TI, PB, V, CR, FE AND BI; AND B. IMPRESSING SAID SENSITIZED SURFACE WITH A SOLUTION COMPRISING AN ACTIVATING METAL ION TO DELINEATE A PATTERN CORRESPONDING TO THE METAL PATTERN, TO REDUCE SAID ACTIVATING METAL ION TO AN ACTIVATING METAL WITHIN SAID PATTERN AND TO DEPOSIT SAID REDUCED ACTIVATING METAL ON SAID PATTERN.
Claim 2
Independent Claim
93 words
A METHOD OF DEPOSITING A METAL PATTERN ON A SURFACE OF A SUBSTRATE, WHICH COMPRISES: A. SENSITIZING THE SURFACE WITH A POSITIVE COLLOIDAL SENSITIZING SOL COMPRISING INSOLUBLE HYDROUS OXIDE PARTICLES OF AN ELEMENT SELECTED FROM THE GROUP CONSISTING OF SN, TI, PB, V, CR, FE AND BI; AND B. IMPRESSING SAID SENSITIZED SURFACE WITH A SOLUTION COMPRISING AN ACTIVATING METAL ION TO DELINEATE A PATTERN CORRESPONDING TO THE METAL PATTERN, TO REDUCE SAID ACTIVATING METAL ION TO AN ACTIVATING METAL WITHIN SAID PATTERN AND TO DEPOSIT SAID REDUCED ACTIVATING METAL ON SAID PATTERN.
Claim 3
Dependent Claim
33 words
THE METHOD AS DEFINED IN CLAIM 1 WHICH FURTHER COMPRISES IMMERSING SAID ACTIVATING METAL-DEPOSITED PATTERN IN A SUITABLE ELECTROLESS PLATING BATH, CATALYZED BY SAID DEPOSITED ACTIVATING METAL, TO DEPOSIT AN ELECTROLESS METAL THEREON.