US3867150A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Printing plate process and apparatus using a laser scanned silver negative
Assignee: WR Grace and Co
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Filing: 1973-06-08
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Granted: 1975-02-18
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Expires: 1993-06-08
Abstract
Abstract This invention is directed to a process and apparatus for forming surfaces in relief such as a printing plate comprising employing a scanning laser to form an optical mask by forming opaque areas in an essentially transparent dry silver sheet, subjecting the exposed sheet to heat to develop the latent image, the resulting optical mask being used for imaging on a photosensitive printing plate using a conventional non-coherent UV light source.
Inventors
- 👤 Arthur D Ketley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 18:27
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; B; B23; B23K; B23K26/00; B23K26/08; B23K26/10; G03F7/00; G03F7/004; G03F7/027; G03F7/0275; G03F7/09; G03F7/095; G03F7/0952; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
130 words
A PROCESS FOR MAKING A PHOTOPOLYMER PLATE WHICH COMPRISES: GENERATING A LATENT IMAGE ON AN OPTICAL MASK SURFACE BY SCANNING THE MASK SURFACE WITH A FOCUSSED BEAM OF MODULATED COHERENT RADIATION HAVING A WAVELENGTH OF ABOUT 3,000 A TO 8,000 A, SAID OPTICAL MASK CONSISTING ESSENTIALLY OF A U-V TRANSMISSIVE SUBSTRATE HAVING COATED THEREON A PHOTOGRAPHIC ENULSION CONTAINING SILVER HALIDE AND CHEMICAL DEVELOPING MATERIAL SEPARATED BY A HEATREALEASING ENCAPSULANT, TO EXPOSE THE PHOTOGRAPHIC EMULSION WITH SAID RADIATION; THERMALLY DEVELOPING THE LATENT IMAGE ON THE OPTICAL MASK BY HEATING THE OPTICAL MASK; AND EXPOSING A PHOTOCURABLE LIQUID LAYER ON A PLATE SUBSTRATE IMAGEWISE THROUGH SAID OPTICAL MASK WITH U-V LIGHT HAVING A WAVELENGTH OF ABOUT 2,000 A TO 4,000 A TO PRODUCE A POLYMER RELIEF SURFACE CORRESPONDING TO THE DEVELOPED IMAGE.
Claim 2
Dependent Claim
130 words
A PROCESS FOR MAKING A PHOTOPOLYMER PLATE WHICH COMPRISES: GENERATING A LATENT IMAGE ON AN OPTICAL MASK SURFACE BY SCANNING THE MASK SURFACE WITH A FOCUSSED BEAM OF MODULATED COHERENT RADIATION HAVING A WAVELENGTH OF ABOUT 3,000 A TO 8,000 A, SAID OPTICAL MASK CONSISTING ESSENTIALLY OF A U-V TRANSMISSIVE SUBSTRATE HAVING COATED THEREON A PHOTOGRAPHIC ENULSION CONTAINING SILVER HALIDE AND CHEMICAL DEVELOPING MATERIAL SEPARATED BY A HEATREALEASING ENCAPSULANT, TO EXPOSE THE PHOTOGRAPHIC EMULSION WITH SAID RADIATION; THERMALLY DEVELOPING THE LATENT IMAGE ON THE OPTICAL MASK BY HEATING THE OPTICAL MASK; AND EXPOSING A PHOTOCURABLE LIQUID LAYER ON A PLATE SUBSTRATE IMAGEWISE THROUGH SAID OPTICAL MASK WITH U-V LIGHT HAVING A WAVELENGTH OF ABOUT 2,000 A TO 4,000 A TO PRODUCE A POLYMER RELIEF SURFACE CORRESPONDING TO THE DEVELOPED IMAGE.
Claim 3
Dependent Claim
95 words
The process according to claim 1 wherein the photosensitive composition consists essentially of (1) a polyene containing at least 2 reactive unsaturated carbon to carbon bonds per molecule, (2) a polythiol containing at least two thiol groups per molecule, the total combined functionality of (a) the reactive unsaturated carbon to carbon bonds per molecule in the polyene and (b) the thiol groups per molecule in the polythiol being greater than 4, and (3) 0.0005 to about 50 parts by weight based on the weight of said polyene and said polythiol of a photocuring rate accelerator.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-02-17 | 1978-08-19 | 1979-02-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-02-17 | 1982-08-19 | 1983-02-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-02-17 | 1986-08-19 | 1987-02-18 | $7700.00 | Window Closed / Lapsed |