US3858551A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for epitaxial growth from the liquid state
Assignee: Panasonic Holdings Corp
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Filing: 1974-04-23
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Granted: 1975-01-07
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Expires: 1994-04-23
Abstract
Abstract An apparatus adapted for epitaxial growth from the liquid state. This apparatus has a furnace tube within which a substrate wafer to be processed and a solution containing a material to be epitaxially grown on the substrate wafer are isolated in cross section from each other before the epitaxial growth. With this arrangement, the constant-temperature zone necessary for the uniform heating of the substrate wafer and the solution can be shortened compared to conventional apparatus.
Inventors
- 👤 Hiroyuki Kobayasi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:59
CPC Classifications
C; C30; C30B; C30B19/00; C30B19/10; C30B19/106; C30B19/06; C30B19/061; C30B19/068
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
126 words
Apparatus for epitaxial growth of a film on a substrate from the liquid state comprising: a horizontally disposed cylindrical furnace tube; a heating coil surrounding a portion of said tube; a cylindrical crucible, coaxial with and disposed within said surrounded portion of the tube, having an aperture in each end wall thereof, and containing a pool of said liquid; and a rotatable substrate support axially extending through one of said apertures and including substrate clamping means at the inserted end thereof and spaced from the support axis whereby to support said substrate above said pool and whereby upon rotation of said support said substrate orbits about said support axis to sequentially immerse the substrate in said pool to effect said growth and to withdraw said substrate.
Claim 2
Dependent Claim
126 words
Apparatus for epitaxial growth of a film on a substrate from the liquid state comprising: a horizontally disposed cylindrical furnace tube; a heating coil surrounding a portion of said tube; a cylindrical crucible, coaxial with and disposed within said surrounded portion of the tube, having an aperture in each end wall thereof, and containing a pool of said liquid; and a rotatable substrate support axially extending through one of said apertures and including substrate clamping means at the inserted end thereof and spaced from the support axis whereby to support said substrate above said pool and whereby upon rotation of said support said substrate orbits about said support axis to sequentially immerse the substrate in said pool to effect said growth and to withdraw said substrate.
References Cited (Backward Citations)
US411504A
Cited
US1537117A
Cited
US2025467A
Cited
US2157875A
Cited
US2701546A
Cited
US3435835A
Cited
US3606986A
Cited
US3551219A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-01-06 | 1978-07-08 | 1979-01-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-01-06 | 1982-07-08 | 1983-01-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-01-06 | 1986-07-08 | 1987-01-07 | $7700.00 | Window Closed / Lapsed |