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US3856694A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for stripping nickel from articles and composition utilized therein

Assignee: Oxy Metal Finishing Corp
•
Filing: 1973-06-18
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Granted: 1974-12-24
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Expires: 1993-06-18
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Abstract

Abstract The present invention is directed to the chemical removal of adherent nickel deposits on plating racks and the like employing a composition which contains therein nitric acid and sources of chloride, copper and tellurium or selenium ions and to a process for stripping such unwanted deposits from electroplating apparatus without noticeable damage to the base metal and at speeds not normally obtainable with prior art compositions and methods.

Inventors

  • 👤 D Becking

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 18:21
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/44

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 67 words
A COMPOSITION FOR STRIPPING ACCUMULATED NICKEL DEPOSITS FROM PLATING APPARATUS AND THE LIKE, WHICH COMPRISES NITRIC ACID AND SOURCES OF CHLORIDE, COPPER AND TELLURIUM OR SELENIUM IONS, SAID CHLORIDE ON BEING PRESENT IN CONCENTRATIONS OF ABOUT 0.01 TO 0.5 M AND SAID TELLURIUM OR SELENIUM IONS BEING PRESENT IN SMALL BUT EFFECTIVE AMOUNTS SUFFICIENT TO ACCELERATE THE STRIPPING RATE WITHOUT NOTICEABLE DELETERIOUS EFFECTS UPON THE PLATING APPARATUS.
Claim 2
Dependent Claim 67 words
A COMPOSITION FOR STRIPPING ACCUMULATED NICKEL DEPOSITS FROM PLATING APPARATUS AND THE LIKE, WHICH COMPRISES NITRIC ACID AND SOURCES OF CHLORIDE, COPPER AND TELLURIUM OR SELENIUM IONS, SAID CHLORIDE ON BEING PRESENT IN CONCENTRATIONS OF ABOUT 0.01 TO 0.5 M AND SAID TELLURIUM OR SELENIUM IONS BEING PRESENT IN SMALL BUT EFFECTIVE AMOUNTS SUFFICIENT TO ACCELERATE THE STRIPPING RATE WITHOUT NOTICEABLE DELETERIOUS EFFECTS UPON THE PLATING APPARATUS.
Claim 3
Dependent Claim 24 words
A composition as defined in claim 1, in which the tellurium or selenium ions are present in concentrations of about 0.005 to 0.2 M.
Claim 4
Dependent Claim 22 words
A composition as defined in claim 1, in which the copper ion is present in concentrations of about 0.01 to 0.5 M.
Claim 5
Dependent Claim 28 words
A composition as defined in claim 1, in which the nitric acid is approximately 42 Be. and is present in an amount of about 4.5 to 14.5 M.
Claim 6
Dependent Claim 57 words
AN AQUEOUS SOLUTION FOR STRIPPING ACCUMULATED NICKEL DEPOSITS FROM PLATING APPARATUS, WHICH CONTAINS THEREIN ABOUT 2 TO 10 GRAMS PER LITER OF TELLURIUM OR SELENIUM DIOXIDE, 600 TO 850 GRAMS PER LITER OF NITRIC ACID, 2 TO 20 GRAMS PER LITER OF COPPER SULFATE, AND 3.5 TO 35.5 GRAMS PER LITER OF A SOURCE OF CHLORIDE IONS.
Claim 7
Dependent Claim 57 words
AN AQUEOUS SOLUTION FOR STRIPPING ACCUMULATED NICKEL DEPOSITS FROM PLATING APPARATUS, WHICH CONTAINS THEREIN ABOUT 2 TO 10 GRAMS PER LITER OF TELLURIUM OR SELENIUM DIOXIDE, 600 TO 850 GRAMS PER LITER OF NITRIC ACID, 2 TO 20 GRAMS PER LITER OF COPPER SULFATE, AND 3.5 TO 35.5 GRAMS PER LITER OF A SOURCE OF CHLORIDE IONS.
Claim 8
Dependent Claim 31 words
An aqueous solution as defined in claim 1, in which the source of chloride ions is selected from the group consisting of sodium chloride, potassium chloride, manganese chloride and cupric chloride.
Claim 9
Dependent Claim 51 words
IB A METHOD OF STRIPPING NICKEL DEPOSITS FROM ARTICLES BY IMMERSING THEM IN A CONCENTRATED NITRIC ACID SOLUTION CONTAINING A CHLORIDE CATALYST, THE IMPROVEMENT WHICH COMPRISES ADDING TO SAID SOLUTION A SMALL BUT EFFECTIVE AMOUNT OF A SELENITE OR TELLURITE COMPOUND CAPABLE OF PROVIDING SELENIUM OR TELLURIUM IONS IN THE SOLUTION.
Claim 10
Dependent Claim 51 words
IB A METHOD OF STRIPPING NICKEL DEPOSITS FROM ARTICLES BY IMMERSING THEM IN A CONCENTRATED NITRIC ACID SOLUTION CONTAINING A CHLORIDE CATALYST, THE IMPROVEMENT WHICH COMPRISES ADDING TO SAID SOLUTION A SMALL BUT EFFECTIVE AMOUNT OF A SELENITE OR TELLURITE COMPOUND CAPABLE OF PROVIDING SELENIUM OR TELLURIUM IONS IN THE SOLUTION.
Claim 11
Dependent Claim 25 words
A stripping method as defined in claim 7, in which the selenium or tellurium ions are present in concentrations of about 0.005 to 0.2 M.

References Cited (Backward Citations)

US3197341A Cited
US3365401A Cited
US3553016A Cited
US3399143A Cited
US3709824A Cited
US3717520A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1977-12-23 1978-06-24 1978-12-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1981-12-23 1982-06-24 1982-12-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1985-12-23 1986-06-24 1986-12-24 $7700.00 Window Closed / Lapsed

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