US3845305A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Microbeam probe apparatus
Assignee: Max-Planck-Gesellschaft zur Förderung der Wissenschaften eV
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Filing: 1973-05-10
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Granted: 1974-10-29
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Expires: 1993-05-10
Abstract
Abstract The invention relates to a microbeam probe in which a test surface is subjected to an intense beam of ions or electrons and the resulting secondary particles are analysed. An apparatus is provided in which a common electrostatic lens of short focal length acts as an objective for the primary beam and also as a collecting lens for the secondary particles. The common lens comprises two rotationally symmetrical lenses of short focal length in series with an apertured diaphragm between them.
Inventors
- 👤 H Liebl
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 09:36
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/22; H01J37/226; H01J37/228; H01J37/252; H01J37/256
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
285 words
A microbeam probe apparatus comprising an ion or an electron particle source (10) for producing an essentially collimated primary beam (12) of charged particles having a relatively high energy, a charged particle objective system including first and second sets of electrodes (26, 24-24, 22) to produce first and second electrostatic lens fields of short focal lengths in first and second areas of space respectively, said fields being positioned to be transversed by the path of said primary beam 12 in the order named, a diaphragm (32) having a fine aperture (34) positioned between said first and second areas of space, a conductive surface (16) comprising a sample area to be investigated positioned in spaced relationship near said second set of electrodes on the side thereof, remote from said first set, means for biasing said electrodes of said first and second sets, and said conductive surface to a. produce first and second electrostatic lens fields which cooperate to focus said primary beam through said aperture (34) into a small spot on said sample area, b. cause secondary charged particles, which emerge from said sample area under the action of said primary beam to accelerate towards said second set of electrodes, and be focused by said second lens field into a focus area within said aperture (34), c. and collimate said secondary particles passing through said opening into a secondary beam (40) of relatively low energy traveling in a direction essentially opposite to that of said primary beam (12), and deflecting means (62) acting on said primary and secondary beams to deflect said relatively low energy secondary beam (40) away from the path of said primary beam while leaving said relatively high energy primary beam essentially unaffected.
Claim 2
Dependent Claim
285 words
A microbeam probe apparatus comprising an ion or an electron particle source (10) for producing an essentially collimated primary beam (12) of charged particles having a relatively high energy, a charged particle objective system including first and second sets of electrodes (26, 24-24, 22) to produce first and second electrostatic lens fields of short focal lengths in first and second areas of space respectively, said fields being positioned to be transversed by the path of said primary beam 12 in the order named, a diaphragm (32) having a fine aperture (34) positioned between said first and second areas of space, a conductive surface (16) comprising a sample area to be investigated positioned in spaced relationship near said second set of electrodes on the side thereof, remote from said first set, means for biasing said electrodes of said first and second sets, and said conductive surface to a. produce first and second electrostatic lens fields which cooperate to focus said primary beam through said aperture (34) into a small spot on said sample area, b. cause secondary charged particles, which emerge from said sample area under the action of said primary beam to accelerate towards said second set of electrodes, and be focused by said second lens field into a focus area within said aperture (34), c. and collimate said secondary particles passing through said opening into a secondary beam (40) of relatively low energy traveling in a direction essentially opposite to that of said primary beam (12), and deflecting means (62) acting on said primary and secondary beams to deflect said relatively low energy secondary beam (40) away from the path of said primary beam while leaving said relatively high energy primary beam essentially unaffected.
Claim 3
Dependent Claim
95 words
The apparatus according to claim 1 wherein said first set of electrodes comprises first and second apertured electrodes (26, 24) transversed by the path of the primary beam (12) in the order named; said second set of electrodes comprises said second electrode (24) and a third apertured electrode (22) transversed by the path of said primary beam 12 in the order named; said second electrode having a substantial thickness in the direction of said beam path to form a substantially field-free space within its aperture; said aperture diaphragm (32) being positioned within said field-free space.
Claim 4
Dependent Claim
62 words
Apparatus according to claim 1 wherein said first electrode (26) is of annular shape; said second electrode (24) has the form of a relatively thick plate whIch has a bore having a portion of large diameter facing said first electrode, and a contiguous annular portion of smaller diameter, and said third electrode (22) has the shape of an apertured relatively thin plate.
Claim 5
Dependent Claim
22 words
Apparatus according to claim 3 in which the apertured diaphragm (32) is positioned between the two cylindrical parts of the second electrode.
Claim 6
Dependent Claim
54 words
Apparatus according to claim 1 further including first deflecting means positioned to deflect the primary beam across said sample surface, and second, auxiliary deflecting means positioned near said objective system between said objective system and said first deflecting means to compensate for lateral shifts of said primary beam caused by said first deflecting means.
Claim 7
Dependent Claim
76 words
Apparatus according to claim 1 further comprising a light-optical system of the Schwarzschild type for observing said sample area of said surface; said light-optical system comprising a first reflecting surface (56) on the side of the third electrode (22) facing said second electrode (24), and a second reflecting surface (58) on the side of said second electrode (24) facing said third electrode (22) to deflect a light beam extending from said sample area to an observer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-10-28 | 1978-04-29 | 1978-10-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-10-28 | 1982-04-29 | 1982-10-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-10-28 | 1986-04-29 | 1986-10-29 | $7700.00 | Window Closed / Lapsed |