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US3843362A Expired / Lapsed US ⏱️ 0.0 years remaining

Latent image mask repair

Assignee: International Business Machines Corp
•
Filing: 1972-11-17
•
Granted: 1974-10-22
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Expires: 1992-11-17
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Abstract

Abstract 1. PROCESS FOR MING AN EXPOSURE MASK COMPRISING THE STEPS OF: PROVIDING A TRANSPARENT SUBSTRATE HAVING FORMED THEREON A LIGHT SENSITIVE LAYER OF DIAZO MATERIAL, HAVING A DISCERNIBLE COLOR, EXPOSING SAID LAYER PATTERNWISE TO ACTINIC RADIATION SUCH THAT THE EXPOSED PORTION OF SAID LAYER BECOMES TRANSPARENT, VISUALLY EXAMINING SAID ALYER WITH THE AID OF A MICROSCOPE, USING LIGHT WHICH DOES NOT ACT TO FURTHER EXPOSE SAID DIAZO MATERIAL, IN ORDER TO LOCATED ANY DEFECT AREAS WHICH REMAIN COLORED AND WHICH SHOULD HAVE BEEN EXPOSED AND MADE TRANSPARENT BY THE ACTINIC RADIATION AND WERE NOT, POSITIONING A SHAPED APERTURE BETWEEN A SOURCE OF ACTINIC LIGHT AND SAID LAYER SUCH THAT SAID DEFECT AREAS ARE IN THE PATH OF SAID APERTURE, EXPOSING SAID DEFECT AREAS TO SAID SOURCE OF ACTINIC LIGHT THROUGH SAID APERTURE, AD REACTING THE REMAINING UNEXPOSED DIAZO MATERIAL WITH A DEVELOPER TO FORM A PATTERNED DIAZO DYE IMAGE ON SAID SUBSTRATE.

Inventors

  • 👤 Fazio J Di
  • 👤 G Giuffre
  • 👤 A Karsch

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 22:28
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03F1/68; G03F1/72

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 151 words
PROCESS FOR MING AN EXPOSURE MASK COMPRISING THE STEPS OF: PROVIDING A TRANSPARENT SUBSTRATE HAVING FORMED THEREON A LIGHT SENSITIVE LAYER OF DIAZO MATERIAL, HAVING A DISCERNIBLE COLOR, EXPOSING SAID LAYER PATTERNWISE TO ACTINIC RADIATION SUCH THAT THE EXPOSED PORTION OF SAID LAYER BECOMES TRANSPARENT, VISUALLY EXAMINING SAID ALYER WITH THE AID OF A MICROSCOPE, USING LIGHT WHICH DOES NOT ACT TO FURTHER EXPOSE SAID DIAZO MATERIAL, IN ORDER TO LOCATED ANY DEFECT AREAS WHICH REMAIN COLORED AND WHICH SHOULD HAVE BEEN EXPOSED AND MADE TRANSPARENT BY THE ACTINIC RADIATION AND WERE NOT, POSITIONING A SHAPED APERTURE BETWEEN A SOURCE OF ACTINIC LIGHT AND SAID LAYER SUCH THAT SAID DEFECT AREAS ARE IN THE PATH OF SAID APERTURE, EXPOSING SAID DEFECT AREAS TO SAID SOURCE OF ACTINIC LIGHT THROUGH SAID APERTURE, AD REACTING THE REMAINING UNEXPOSED DIAZO MATERIAL WITH A DEVELOPER TO FORM A PATTERNED DIAZO DYE IMAGE ON SAID SUBSTRATE.
Claim 2
Dependent Claim 151 words
PROCESS FOR MING AN EXPOSURE MASK COMPRISING THE STEPS OF: PROVIDING A TRANSPARENT SUBSTRATE HAVING FORMED THEREON A LIGHT SENSITIVE LAYER OF DIAZO MATERIAL, HAVING A DISCERNIBLE COLOR, EXPOSING SAID LAYER PATTERNWISE TO ACTINIC RADIATION SUCH THAT THE EXPOSED PORTION OF SAID LAYER BECOMES TRANSPARENT, VISUALLY EXAMINING SAID ALYER WITH THE AID OF A MICROSCOPE, USING LIGHT WHICH DOES NOT ACT TO FURTHER EXPOSE SAID DIAZO MATERIAL, IN ORDER TO LOCATED ANY DEFECT AREAS WHICH REMAIN COLORED AND WHICH SHOULD HAVE BEEN EXPOSED AND MADE TRANSPARENT BY THE ACTINIC RADIATION AND WERE NOT, POSITIONING A SHAPED APERTURE BETWEEN A SOURCE OF ACTINIC LIGHT AND SAID LAYER SUCH THAT SAID DEFECT AREAS ARE IN THE PATH OF SAID APERTURE, EXPOSING SAID DEFECT AREAS TO SAID SOURCE OF ACTINIC LIGHT THROUGH SAID APERTURE, AD REACTING THE REMAINING UNEXPOSED DIAZO MATERIAL WITH A DEVELOPER TO FORM A PATTERNED DIAZO DYE IMAGE ON SAID SUBSTRATE.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1977-10-21 1978-04-22 1978-10-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1981-10-21 1982-04-22 1982-10-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1985-10-21 1986-04-22 1986-10-22 $7700.00 Window Closed / Lapsed

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