US3833482A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Matrix for forming mesh
Assignee: Buckbee Mears Co
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Filing: 1973-03-26
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Granted: 1974-09-03
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Expires: 1993-03-26
Abstract
Abstract A reusable sandwich type matrix for the formation of fine mesh comprising a base plate, a photoresist defining the mesh pattern, and a silica coating encapsulating the top of the base plate and the photoresist.
Inventors
- 👤 D Jacobus
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 16:27
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/02; H01J9/14; C; C25; C25D; C25D1/00; C25D1/08; H01J19/00; H01J2893/00; H01J2893/0001; H01J2893/0012; H01J2893/0019; H01J2893/0022
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
93 words
A matrix for use in the production of fine mesh comprising a base plate having a suitable flat surface; a plurality of islands of photoresist located in a spaced and regular pattern on a surface of said base plate to thereby provide a pattern of interior interconnected openings between said islands of photoresist; a layer of silica covering said islands of resist and said exposed regions between said islands and a layer of conducting material located in the recess and on top of the silica to thereby provide a base for electroforming thereon.
Claim 2
Dependent Claim
19 words
The matrix of claim 2 wherein said layer of silica has a thickness on the order of 20,000 angstroms.
Claim 3
Independent Claim
89 words
A method of forming a matrix plate which comprises forming a substrate with a substantially flat surface, applying to said surface a photoresist, photoprinting on said photoresist coating an image of a grid for forming a mesh pattern, removing the unexposed portion of said coating to produce a set of resist islands on the surface of said substrate and then applying a layer of silica over said photoresist coating and said substrate to produce a silica coated matrix suitable for repeated use as a matrix for manufacture of mesh.
Claim 4
Dependent Claim
21 words
The process of claim 4 wherein the recess region between said resist islands are covered with a layer of conducting material.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-09-02 | 1978-03-04 | 1978-09-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-09-02 | 1982-03-04 | 1982-09-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-09-02 | 1986-03-04 | 1986-09-03 | $7700.00 | Window Closed / Lapsed |