US3802889A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist composition useful for making chromium film masks
Assignee: International Business Machines Corp
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Filing: 1972-08-03
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Granted: 1974-04-09
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Expires: 1992-08-03
Abstract
Abstract A photopolymerizable composition which acts as a negative etch resist useful in making chrome masks. A water based resist is employed which essentially comprises the polymerizable compound of acrylamide and gelatin to which is added the wetting agent Tergitol NPX. In the preferred method of making the chrome mask, the resist is prepared and processed with aqueous solutions thus eliminating the need for organic solvents.
Inventors
- 👤 E Skarvinko
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 13:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/032
Claims Analysis
Total Claims: 1
Claim 1
Independent Claim
10 words
A photopolymerizable, negative, water based photoresist having the following formulation:
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-04-08 | 1977-10-08 | 1978-04-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-04-08 | 1981-10-08 | 1982-04-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-04-08 | 1985-10-08 | 1986-04-09 | $7700.00 | Window Closed / Lapsed |