US3799179A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Processing apparatus with precisely controlled agitation
Assignee: Individual
•
Filing: 1972-03-20
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Granted: 1974-03-26
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Expires: 1992-03-20
Abstract
Abstract Apparatus for processing semiconductor wafers while providing precise control over the rate of agitation of processing solution in contact with the wafers. The invention has utility in several processing operations on semiconductor wafers such as developing, photolithographic etching and bubble cleaning. The apparatus includes a tank for holding a quantity of processing solution. A sparger, placed in the tank, has a plurality of apertures for releasing a precisely controlled amount of an inert gas such as nitrogen into the processing solution. A carrier loaded with a plurality of semiconductor wafers is placed on top of the sparger. During processing a precisely controlled amount of gas is released through the apertures in the sparger and bubbles up through the processing solution in intimate contact with the semiconductor wafers. This bubbling action provides precisely controlled agitation of the processing solution in intimate contact with the wafers.
Inventors
- 👤 G Thomas
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 18:15
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0428; Y; Y10; Y10S; Y10S134/00; Y10S134/902
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
220 words
Apparatus for precisely controlling the agitation of processing solution in intimate contact with semiconductor wafer components immersed in the processing solution and being treated by the processing solution, and thereby precisely controlling the rate of processing of the components, and comprising: a. a container for holding a quantity of processing solution; b. means for holding a plurality of components for immersion in processing solution located in said container and including a semiconductor wafer carrier means having a plurality of separate compartments located in an array of rows and columns, whereby individual components may be inserted into said individual compartments, and the tray with the components may be inserted into the processing solution in said container, whereby the components may be processed by the processing solution; c. means for releasing a precisely controlled amount of gas into the processing solution and below the components and including a plurality of apertures located below the components when the components are immersed in processing solution in said container, and a timer means for indicating the length of time during which gas is bieng released into the processing solution, whereby the controlled amount of released gas may bubble up through the processing solution in intimate contact with the components and provide a precisely controlled agitation of the processing solution in intimate contact with the components.
Claim 2
Dependent Claim
220 words
Apparatus for precisely controlling the agitation of processing solution in intimate contact with semiconductor wafer components immersed in the processing solution and being treated by the processing solution, and thereby precisely controlling the rate of processing of the components, and comprising: a. a container for holding a quantity of processing solution; b. means for holding a plurality of components for immersion in processing solution located in said container and including a semiconductor wafer carrier means having a plurality of separate compartments located in an array of rows and columns, whereby individual components may be inserted into said individual compartments, and the tray with the components may be inserted into the processing solution in said container, whereby the components may be processed by the processing solution; c. means for releasing a precisely controlled amount of gas into the processing solution and below the components and including a plurality of apertures located below the components when the components are immersed in processing solution in said container, and a timer means for indicating the length of time during which gas is bieng released into the processing solution, whereby the controlled amount of released gas may bubble up through the processing solution in intimate contact with the components and provide a precisely controlled agitation of the processing solution in intimate contact with the components.
Claim 3
Dependent Claim
37 words
Apparatus as set forth in claim 1 wherein said means for releasing a controlled amount of gas into the processing solution includes a flow meter for controlling the rate of release of gas into the processing solution.
Claim 4
Dependent Claim
48 words
Apparatus as set forth in claim 2 wherein said means for releasing a controlled amount of gas into the processing solution includes a sparger means which may be inserted into and placed on the bottom of said container, said sparger means having said plurality of apertures formed therein.
Claim 5
Dependent Claim
84 words
Apparatus as set forth in claim 3 wherein the apertures in said sparger means are located relative to the compartments in said tray means such that when the tray means is placed on top of the sparger means the apertures in said tray means will form rows on each side of said rows of compartments, whereby the rows of apertures on each side of a row of compartments will provide controlled agitation of processing solution on both sides of components located in said compartments.
Claim 6
Dependent Claim
48 words
Apparatus as set forth in claim 1 wherein said means for releasing a controlled amount of gas into the processing solution includes a sparger means which may be inserted into and placed on the bottom of said container, said sparger means having said plurality of apertures formed therein.
Claim 7
Dependent Claim
84 words
Apparatus as set forth in claim 5 wherein the apertures in said sparger means are located relative to the compartments in said tray means such that when the tray means is placed on top of the sparger means the apertures in said tray means will form rows on each side of said rows of compartments, whereby the rows of apertures on each side of a row of compartments will provide controlled agitation of processing solution on both sides of compartments located in said compartments.
Claim 8
Dependent Claim
216 words
Apparatus for precisely controlling the agitation of processing solution in intimate contact with semiconductor components immersed in the processing solution and being treated by the processing solution, and thereby precisely controlling the rate of processing of the components, and comprising: a. a container for holding a quantity of processing solution; b. means for holding a plurality of componenTs for immersion in processing solution located in said container and including a semiconductor component carrier means having a plurality of separate compartments located in an array of rows and columns, whereby individual components may be inserted into said individual compartments, and the tray with the components may be inserted into the processing solution in said container, whereby the components may be processed by the processing solution; c. means for releasing a precisely controlled amount of gas into the processing solution and below the components and including a plurality of apertures located below the components when the components are immersed in processing solution in said container, and a flow meter means for precisely controlling the flow of gas released into the processing solution, whereby the controlled amount of released gas may bubble up through the processing solution in intimate contact with the components and provide a precisely controlled agitation of the processing solution in intimate contact with the components.
Claim 9
Dependent Claim
216 words
Apparatus for precisely controlling the agitation of processing solution in intimate contact with semiconductor components immersed in the processing solution and being treated by the processing solution, and thereby precisely controlling the rate of processing of the components, and comprising: a. a container for holding a quantity of processing solution; b. means for holding a plurality of componenTs for immersion in processing solution located in said container and including a semiconductor component carrier means having a plurality of separate compartments located in an array of rows and columns, whereby individual components may be inserted into said individual compartments, and the tray with the components may be inserted into the processing solution in said container, whereby the components may be processed by the processing solution; c. means for releasing a precisely controlled amount of gas into the processing solution and below the components and including a plurality of apertures located below the components when the components are immersed in processing solution in said container, and a flow meter means for precisely controlling the flow of gas released into the processing solution, whereby the controlled amount of released gas may bubble up through the processing solution in intimate contact with the components and provide a precisely controlled agitation of the processing solution in intimate contact with the components.
Claim 10
Dependent Claim
49 words
Apparatus as set forth in claim 7 wherein said means for releasing a precisely controlled amount of gas into the processing solution includes a sparger means which may be inserted into and placed on the bottom of said container, said sparger means having said plurality of apertures formed therein.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-03-25 | 1977-09-24 | 1978-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-03-25 | 1981-09-24 | 1982-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-03-25 | 1985-09-24 | 1986-03-26 | $7700.00 | Window Closed / Lapsed |