Chemical vapor deposition coatings on titanium

Abstract

Abstract A process for coating titanium-containing substrates with a dense, adherent, chemically vapor deposited coating by initially effecting a protective, adhesion-promoting, intermediate layer on the titanium surface and subsequently depositing from the vapor phase a metal nitride, carbide, or carbonitride coating on the intermediate film. For example, a titanium article may be initially nitrided to provide a titanium nitride protective layer and titanium nitride, titanium carbide, or titanium carbonitride may subsequently be deposited from the vapor phase onto this film to provide a dense, adherent, protective coating on the titanium article. The barrier layer serves to promote adhesion between the titanium substrate and the final overlay and to prevent reaction between the substrate and such a reaction ingredient as titanium tetrachloride, which is a preferred constituent for supplying titanium in the titanium carbide, nitride, or carbonitride final coating.

Inventors

• 👤 C Reedy

Bibliographic Details