Adjusting device for a particle beam

Claim 2

An adjusting device for a beam of charged particles having two deflection systems each deflecting the particles in two mutually perpendicular directions and having deflection planes which follow one another in the travelling direction of the particle beam, said deflection systems having a given coupling at which the ratio of the deflection angles in both systems is proportional to the distance of a given deflection plane of each of the deflection systems from an arbitrarily chosen third plane which is situated parallel to said deflection planes.

Claim 3

An adjusting device as claimed in claim 1, wherein said the deflection systems include deflector units in both planes, so as to provide deflection in two mutually perpendicular directions at right angles to the direction of propagation of the beam.

Claim 4

An adjusting device as claimed in claim 1 wherein said deflection systems comprise electromagnetic coils, and means to adjust the energizing current for each of said coils to adjust the coupling between the deflection systems.

Claim 5

An adjusting device as claimed in claim 3, wherein said the electromagnetic deflector coils are formed by rectangular coil units mounted on a support.

Claim 6

An adjusting device as claimed in claim 3 wherein the coils of both deflecting systems have a geometry and each have a number of turns whereby said coils have said given coupling when said coils are connected in series.

Claim 7

An electron-optical device comprising an electron source for generating an electron beam and, viewed in the direction of propagation of the beam, in succession an input diaphragm and an electron-optical system, and between the electron source and the input diaphragm an adjusting device including two deflection systems each deflecting the electrons beam in two mutually perpendicular directions and having deflection planes which follow one another in the travelling direction of the electron beam, said deflection systems having a given coupling at which the ratio of the deflection angles in both systems is proportional to the distance of a given deflection plane of each of the deflection systems from an arbitrarily chosen third plane which is situated parallel to said deflection planes.

Claim 8

An electron-optical device comprising an electron source for generating an electron beam and, viewed in the direction of propagation of the beam, in succession an input diaphragm and an electron-optical system, and between the electron source and the input diaphragm an adjusting device including two deflection systems each deflecting the electrons beam in two mutually perpendicular directions and having deflection planes which follow one another in the travelling direction of the electron beam, said deflection systems having a given coupling at which the ratio of the deflection angles in both systems is proportional to the distance of a given deflection plane of each of the deflection systems from an arbitrarily chosen third plane which is situated parallel to said deflection planes.

Claim 9

An electron-optical device as claimed in claim 6, wherein a plane at right angles to the direction of the beam at the area of the object point acts as the third plane for the beam.

Claim 10

An electron-optical device as claimed in claim 6, wherein the plane at right angles to the direction of the beam at the area of the input diaphragm acts as the third transverse plane.

Claim 11

An electron-optical device as claimed in claim 6, wherein the electron source and the plane containing the input diaphragm are combined in a mutually dependent manner to constitute the third plane.