Method of selectively diffusing carrier killers into integrated circuits utilizing polycrystalline regions

Abstract

Abstract An integrated circuit and method of making same comprising substrate with one or more epitaxial layers containing active circuit elements, circuit element isolation being obtained by polycrystalline regions with a carrier killer diffused therein. One particular feature of the disclosure is a method of making integrated circuits including the step of diffusing gold selectively into a semiconductor substrate through a polycrystalline region of high diffusion velocity which surrounds at least one active circuit element in the substrate.

Inventors

• 👤 K Wakamiya
• 👤 I Kobayshi

Bibliographic Details