Abstract Optical thickness rate monitor for use with a vacuum chamber having an evaporation source. Means is provided for forming an aperture which is exposed to the vapors from the source. An elongate element is provided and means is also provided for progressively advancing the elongate element past the aperture so that it is exposed to the vapor stream from the evaporation source so that any coating material is deposited on the elongate element. Means is provided for supplying a beam of radiation to the element so that the radiation is affected by any coating deposited on the element. Means is then provided for determining the manner in which the radiation is affected by changes in the coating which is being deposited on the element. Automatic means is provided for controlling the rate of evaporation from the evaporation source and monitoring the optical thickness to which the coating is deposited on the element.
A method as in claim 2 together with the step of causing the beam of radiation to scan the substrate for a predetermined distance in the direction of travel of the substrate.
Claim 2
Dependent Claim
47 words
A method as in claim 2 wherein the vapor stream impinges on one side of the substrate and wherein the beam of radiation impinges on the other side of the substrate opposite the side on which the materials are deposited on the substrate from the vapor stream.
Claim 3
Dependent Claim
31 words
A method as in claim 2 together with the step of automatically controlling the evaporation from said source in accordance with a characteristic of the material being deposited upon the substrate.
Claim 4
Dependent Claim
126 words
In a method for measuring the rate of deposition of material on an article while in a vacuum chamber by the use of a substantially transparent substrate in the vacuum chamber, creating a vapor stream of coating material at a predetermined rate within the vacuum chamber, continuously advancing the substrate in the vacuum chamber at a substantially constant speed so that one side of the substrate is exposed to the vapor stream whereby a layer of coating material from the vapor stream is deposited on successive portions of said one side of the substrate, and measuring the rate of deposition of successive portions of the coating being deposited on the substrate while the substrate is moving solely by a determination of optical properties of the coating.
Claim 5
Dependent Claim
54 words
A method as in claim 5 together with the step of providing a reference of the desired rate of deposition of the coating material on the substrate and changing the rate of creation of the coating material when the optical thickness measured differs from the reference until the desired rate of deposition is obtained.
Claim 6
Dependent Claim
263 words
In a method for measuring the rate of deposition of material on an article while in a vacuum chamber by the use of a substantially transparent substrate in the vacuum chamber, creating a vapor stream of coating material at a predetermined rate within the vacuum chamber, continuously advancing the substrate in the vacuum chamber at a substantially constant speed so that one side of the substrate is exposed to the vapor stream whereby a layer of coating material from the vapor stream is deposited on successive portions of said one side of the substrate, measuring the rate of deposition of successive portions of the coating being deposited on the substrate while the substrate is moving solely by a determination of optical properties of the coating, blocking said one side of the substrate from said vapor stream at periodic intervals so that alternate spaced portions of said one side are uncoated by said vapor stream, forming sample and reference beams which are chopped out of phase with each other in a manner which corresponds with the blocking of said one side of the substrate, directing the sample and reference beams toward the substrate so that they impinge upon the substrate while it is moving with the sample beam striking the coating portions and the reference beam striking the uncoated portions, and ascertaining the manner in which the sample and reference beams are affected by coated and uncoated portions of the substrate to thereby determine the thickness of the coating on the coated portions of the substrate solely by the optical properties of the coating.