Process for etching metals employing ultrasonic vibration

Abstract

Abstract This disclosure is directed to a metal etching solution and process for etching very fine metal lines or a metal conductive pattern used, for example, in the semiconductor industry where an integrated circuit conductive metal pattern is formed on an insulating semiconductor substrate surface to provide interconnection between the devices in the semiconductor substrate as per a desired circuit configuration. The process uses ultrasonic etching with the addition of either a mono or polyhydric alcohol to the metal etching acid solution. Some examples of the alcohol additives used in the solution are isopropanol, n-propanol, cyclohexanol, benzyl alcohol, glycol, and glycerine.

Inventors

• 👤 E Chough

Bibliographic Details