Rf sputtering apparatus
Abstract
Abstract An r. f. sputter coating apparatus includes an electrically isolated sputter shield surrounding the glow discharge region between anode and cathode. An r. f. signal may be applied to the shield to drive the glow discharge more positive with respect to anode potential. In addition, when sputtering conductive materials, a d. c. potential may be applied to the shield. When applying r. f. to the shield a variable inductance may be placed in parallel with the shield so as to form a parallel resonant circuit and maintain potential between shield and ground a maximum. A matching network is provided to assure maximum power transfer from the r.f. generator into the discharge. The network may include a vacuum capacitor formed within the dark space of the cathode on the cathode back side. Automatic electronic tuning of the matching network can be provided. A reactance tube variable network connected between the r. f. output and the matching network compensates for load circuit changes during sputtering. The shield may also be used to advantage in sputter etching equipment.
Inventors
- 👤 K Scow
- 👤 J Tuttle
Bibliographic Details
Claims Analysis
Total Claims: 11References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-10-01 | 1977-04-02 | 1977-10-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-10-01 | 1981-04-02 | 1981-10-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-10-01 | 1985-04-02 | 1985-10-02 | $7700.00 | Window Closed / Lapsed |