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US3759762A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of forming integrated circuits utilizing low resistance valueslow temperature deposited oxides and shallow junctions

Assignee: Motorola Solutions Inc
•
Filing: 1970-10-19
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Granted: 1973-09-18
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Expires: 1990-10-19
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Abstract

Abstract A SEMICONDUCTOR STRUCTURE IS DESCRIBED WHEREIN INTEGRALLY FORMED RESISTORS ARE EMPLOYED HAVING A PREFERRED RESISTANCE VALUE OF APPROXIMATELY 50 OHMS PER SQUARE. ADDITIONALLY, PROCESSING IS COMPATIBLE WITH THIS LOW RESISTANCE VALUE AND INCLUDES LOW TEMPERATURE DEPOSITION OF PASSIVATING LAYERS, IMPROVED CLEANING AND ANNEALING CYCLES.

Inventors

  • 👤 F Barone
  • 👤 D Tolliver

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 06:32
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/40; H10D1/43; H10D1/01; H10D1/025; H10D99/00; H10P; H10P95/00; Y; Y10; Y10S; Y10S148/00; Y10S148/017; Y10S148/043; Y10S148/049; Y10S148/06; Y10S148/118; Y10S148/173

Claims Analysis

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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1976-09-17 1977-03-19 1977-09-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1980-09-17 1981-03-19 1981-09-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1984-09-17 1985-03-19 1985-09-18 $7700.00 Window Closed / Lapsed

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