Patent US3196679A successfully refreshed from Google Patents.
US3754901A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Evaporation source for device metallization
Assignee: United States Department of the Army
•
Filing: 1972-03-24
•
Granted: 1973-08-28
•
Expires: 1992-03-24
Abstract
Abstract An evaporation source is provided for device metallization. The evaporation source, an aluminum alloy, comprises the chemical composition in percent by weight: 0.5 silicon, 0.5 iron, 3.8 to 4.9 copper, 0.3 to 0.9 manganese, 1.2 to 1.8 magnesium, 0.1 chromium, 0.25 zinc, balance aluminum.
Inventors
- 👤 E Hall
- 👤 E Philofsky
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 16:21
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C22; C22C; C22C21/00; C22C21/12
Claims Analysis
Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-08-27 | 1977-02-26 | 1977-08-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-08-27 | 1981-02-26 | 1981-08-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-08-27 | 1985-02-26 | 1985-08-28 | $7700.00 | Window Closed / Lapsed |