Method of vacuum evaporation
Abstract
Abstract A METHOD OF VAPOR DEPOSITING A UNIFORM LAYER OF MATERIAL ON THE SURFACE OF CYLINDRICAL SUBSTRATE WHICH COMPRISES ROTATING SAID SUBSTRATE SIMULTANEOUSLY ABOUT ITS PERPENDICULAR AXIS AND LONGITUDINAL AXIS WHILE MAINTAINING THE SUBSTRATE AT A PLANE INCLINED TO THE HORIZONTAL, WITH A SMALL SURFACE SOURCE OF EVAPORANT LOCATED BELOW SAID ROTATING SUBSTRATE, WITH THE RATIO OF THE RADIUS OF THE SUBSTRATE TO THE SOURCE-TO-SUBSTRATE DISTANCE BEING MAINTAINED FROM ABOUT 0 TO 1.0, SAID EVAPORANT SOURCE EMITTING A VAPOR FLUX WHICH DEPOSITS AS A SUBSTANTIALLY UNIFORM LAYER UPON THE SURFACE OF SAID SUBSTRATE BY MAINTAINING A SLOTTED MASK BETWEEN THE SUBSTRATE AND EVAPORANT SOURCE. WHILE MAINTAINING SAID SUBSTRATE AND EVAPORANT SOURCE UNDER VACUUM CONDITIONS DURING THE ENTIRE EVAPORATION CYCLE.
Inventors
- 👤 W Little
Bibliographic Details
Claims Analysis
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