Abstract Apparatus and method for the deposition of semiconductor material onto semiconductor wafers by immersing them in a source of liquid semiconductor material. The apparatus includes a chamber, a wafer holder, and a plug, the plug adapted to rest upon the liquid residing in the chamber during mixing of the liquid, and to be pushed through the liquid, thereby forcing the liquid to flow through the space between the plug and the walls of the chamber, that space acting as a filter to prevent solid contaminants from coming into contact with the wafers in the holder. The floating plug also serves to prevent volatilization of constituents during the mixing of the semiconductor and dopants.
Inventors
👤 R Solomon
👤 Fevere D De
Bibliographic Details
Application Number—
JurisdictionUS
Data Sourcegoogle_patents
Last Synchronized2026-11-02 22:53
CPC Classifications
C; C30; C30B; C30B19/00; C30B19/06; C30B19/062
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
167 words
Apparatus for deposition of semiconductor material onto semiconductor wafers by immersing them in a source of liquid semiconductor material comprising: a chamber having substantially vertical walls adapted to hold a supply of high temperature liquid semicondUctor material; an inverted U-shaped wafer holder having indentations on its inside faces adapted to hold the wafers, said holder being adapted to fit into said chamber slideably adjacent said walls, the top of said inverted U-being above the level of said wafers, thereby overlying the top of said liquid supply to prevent volatilization; a solid plug adapted to fit into said chamber slideably adjacent said walls, leaving a small space between its periphery and said walls, said plug adapted to rest upon liquid residing within said chamber and to be pushed through such liquid by said holder, thereby forcing liquid to flow through said small space, said small space acting as a filter to prevent any solid contaminants in said liuqid from coming into contact with the wafers in said holder.
Claim 2
Dependent Claim
167 words
Apparatus for deposition of semiconductor material onto semiconductor wafers by immersing them in a source of liquid semiconductor material comprising: a chamber having substantially vertical walls adapted to hold a supply of high temperature liquid semicondUctor material; an inverted U-shaped wafer holder having indentations on its inside faces adapted to hold the wafers, said holder being adapted to fit into said chamber slideably adjacent said walls, the top of said inverted U-being above the level of said wafers, thereby overlying the top of said liquid supply to prevent volatilization; a solid plug adapted to fit into said chamber slideably adjacent said walls, leaving a small space between its periphery and said walls, said plug adapted to rest upon liquid residing within said chamber and to be pushed through such liquid by said holder, thereby forcing liquid to flow through said small space, said small space acting as a filter to prevent any solid contaminants in said liuqid from coming into contact with the wafers in said holder.
Claim 3
Dependent Claim
16 words
The apparatus of claim 1 further characterized by there being four walls arranged in a rectangle.
Claim 4
Dependent Claim
16 words
The apparatus of claim 2 further characterized by said holder and said plug having rectangular cross-sections.
Claim 5
Dependent Claim
18 words
The apparatus of claim 3 further characterized by said holder and said plug having substantially the same perimeter.