US3742592A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electrically alterable integrated circuit read only memory unit and process of manufacturing
Assignee: Intersil Corp
•
Filing: 1971-05-03
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Granted: 1973-07-03
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Expires: 1991-05-03
Abstract
Abstract An integrated circuit read only memory matrix comprised of transistors having emitter and collector contacts connecting rows and columns. Selected base-emitter junctions are electrically shorted by the application of successive reverse current pulses therethrough while monitoring junction resistance to thereby establish single PN junctions at such selected connections.
Inventors
- 👤 J Rizzi
- 👤 L Fagan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 18:45
CPC Classifications
H; H10; H10B; H10B69/00; G; G11; G11C; G11C17/00; G11C17/06; G11C17/14; G11C17/16; G11C17/18; H10W; H10W20/00; H10W20/40; Y; Y10; Y10S; Y10S148/00; Y10S148/055
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
132 words
A process of manufacturing an integrated circuit READ ONLY MEMORY matrix comprising the steps of diffusing transistors inTo a die in rows with each row thereof having a common collector, attaching a separate electrical contact to each common collector, forming electrical contacts in separate columns extending transversely of said rows with each column contact engaging the emitter of a transistor in a separate row thereof, applying pulsed electrical power between selected collector contacts and column contacts with the proper polarity and sufficient current to cause progressive degradation of the base-emitter junction of the transistor connected between said contacts, and continuously monitoring the reverse current resistance of the base-emitter junction of the transistor while applying said pulsed electrical power and terminating the application of power when the resistance decreases to a predetermined value.
Claim 2
Dependent Claim
132 words
A process of manufacturing an integrated circuit READ ONLY MEMORY matrix comprising the steps of diffusing transistors inTo a die in rows with each row thereof having a common collector, attaching a separate electrical contact to each common collector, forming electrical contacts in separate columns extending transversely of said rows with each column contact engaging the emitter of a transistor in a separate row thereof, applying pulsed electrical power between selected collector contacts and column contacts with the proper polarity and sufficient current to cause progressive degradation of the base-emitter junction of the transistor connected between said contacts, and continuously monitoring the reverse current resistance of the base-emitter junction of the transistor while applying said pulsed electrical power and terminating the application of power when the resistance decreases to a predetermined value.
Claim 3
Dependent Claim
37 words
The process of claim 1 further defined by applying a monitor pulse to said transistor between each power pulse for accomplishing said monitoring of the resistance of the base-emitter junction of the transistor to reverse current flow.
Claim 4
Dependent Claim
29 words
The process of claim 1 further defined by limiting the pulse height and pulse width of said power pulses to incrementally degrade the base-emitter junction with each pulse application.
Claim 5
Dependent Claim
45 words
The process of claim 3 further defined by monitoring the reverse current resistance of the base-emitter junction by applying low current reverse bias monitoring pulses across said base-emitter junction and terminating application of said power pulses upon predetermined reverse junction voltage with said monitor pulses.
Claim 6
Dependent Claim
142 words
A process of manufacturing an integrated circuit READ ONLY MEMORY matrix comprising the steps of forming a plurality of transistors in a die in rows with each row thereof having a common collector, attaching a separate electrical contact to each common collector, forming electrical contacts in separate columns extending transversely of said rows with each column contact engaging the emitter of a transistor in a separate row thereof, applying pulsed electrical power between the collector and emitter of a selected transistor of said matrix with sufficient current to incrementally degrade the base-emitter junction thereof, monitoring the resistance between the collector and emitter contacts of the selected transistor during pulsed power application as a measure of base-emitter junction resistance, and terminating power application at predetermined monitored resistance of the base-emitter junction to prevent damage to the adjacent base-collector junction of the selected transistor.
Claim 7
Dependent Claim
142 words
A process of manufacturing an integrated circuit READ ONLY MEMORY matrix comprising the steps of forming a plurality of transistors in a die in rows with each row thereof having a common collector, attaching a separate electrical contact to each common collector, forming electrical contacts in separate columns extending transversely of said rows with each column contact engaging the emitter of a transistor in a separate row thereof, applying pulsed electrical power between the collector and emitter of a selected transistor of said matrix with sufficient current to incrementally degrade the base-emitter junction thereof, monitoring the resistance between the collector and emitter contacts of the selected transistor during pulsed power application as a measure of base-emitter junction resistance, and terminating power application at predetermined monitored resistance of the base-emitter junction to prevent damage to the adjacent base-collector junction of the selected transistor.
Claim 8
Dependent Claim
43 words
The process of claim 5 further characterized by monitoring the resistance of the base-emitter junction by applying low level monitoring pulses between application of power pulses, and terminating application of power pulses at a predetermined emitter to collector resistance of the selected transistor.
References Cited (Backward Citations)
US3423822A
Cited
US3641516A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-07-02 | 1977-01-01 | 1977-07-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-07-02 | 1981-01-01 | 1981-07-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-07-02 | 1985-01-01 | 1985-07-03 | $7700.00 | Window Closed / Lapsed |