US3740554A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Multi-ampere duopigatron ion source
Assignee: United States Atomic Energy Commission
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Filing: 1972-04-13
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Granted: 1973-06-19
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Expires: 1992-04-13
Abstract
Abstract A duoplasmatron ion source is modified to provide a large plasma surface with a uniform density at a target cathode. The target cathode and the acceleration and deceleration electrodes are gridded or multi-apertured and are spaced in close proximity each to the others with the apertures being in alignment. With such an arrangement, it is possible to extract multi-ampere bright ion beams at energies of tens of KeV. Conversion of the ion beam to a neutral particle beam can be readily accomplished by addition of a gas cell.
Inventors
- 👤 O Morgan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 03:11
CPC Classifications
H; H01; H01J; H01J27/00; H01J27/02; H01J27/08; H01J27/10
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
361 words
A high current duopigatron ion source comprising a heated filament cathode; an intermediate electrode provided with an apertured, tapered lower end portion, said intermediate electrode enclosing said filament cathode and adapted to receive a feed gas thereinto; a source coil encompassing the upper portion of said intermediate electrode; a source magnet supply connected to said coil; a copper anode insulatingly spaced from said intermediate electrode, said anode being provided with a centrally disposed aperture and a hollow elongated tail portion contingent with said aperture and extending longitudinally away from said intermediate electrode; a target cathode assembly defining an elongated ion beam drift space and including a first, centrally apertured electrode insulatingly spaced from said anode and encompassing a portion of said anode tail portion, a first tubular elongated member affixed to said first electrode, an annular auxiliary, field shaping coil affixed to said first member, a second tubular member affixed to said auxiliary coil, a third tubular member affixed to said second tubular member, a cylindrical target cathode support member affixed to said third tubular member, a fourth elongated tubular member affixed to said cathode support member and to the housing of said ion source, and a multiapertured target cathode supported by said cathode support member; means for cooling said intermediate electrode, anode, and first electrode, a source of arc supply connected between said filament cathode and said anode; a multi-apertured acceleration electrode mounted beyond and closely spaced from said apertured target cathode; a source of negative acceleration voltage connected to said acceleration electrode; a source of high voltage connected to said target cathode; means for cooling said acceleration electrode; a multi-apertured deceleration electrode connected to ground and mounted beyond and in close proximity to said apertured acceleration electrode; and means for cooling said deceleration electrode, said anode and target cathode assembly providing a long mean free path for the electrons produced by the ion source discharge with the combined effect of shaping the electric and magnetic fields to produce a large uniform density plasma surface at the surface of said apertured target cathode thereby permitting the extraction of a high density and high temperature ion beam through said apertured electrodes.
Claim 2
Dependent Claim
361 words
A high current duopigatron ion source comprising a heated filament cathode; an intermediate electrode provided with an apertured, tapered lower end portion, said intermediate electrode enclosing said filament cathode and adapted to receive a feed gas thereinto; a source coil encompassing the upper portion of said intermediate electrode; a source magnet supply connected to said coil; a copper anode insulatingly spaced from said intermediate electrode, said anode being provided with a centrally disposed aperture and a hollow elongated tail portion contingent with said aperture and extending longitudinally away from said intermediate electrode; a target cathode assembly defining an elongated ion beam drift space and including a first, centrally apertured electrode insulatingly spaced from said anode and encompassing a portion of said anode tail portion, a first tubular elongated member affixed to said first electrode, an annular auxiliary, field shaping coil affixed to said first member, a second tubular member affixed to said auxiliary coil, a third tubular member affixed to said second tubular member, a cylindrical target cathode support member affixed to said third tubular member, a fourth elongated tubular member affixed to said cathode support member and to the housing of said ion source, and a multiapertured target cathode supported by said cathode support member; means for cooling said intermediate electrode, anode, and first electrode, a source of arc supply connected between said filament cathode and said anode; a multi-apertured acceleration electrode mounted beyond and closely spaced from said apertured target cathode; a source of negative acceleration voltage connected to said acceleration electrode; a source of high voltage connected to said target cathode; means for cooling said acceleration electrode; a multi-apertured deceleration electrode connected to ground and mounted beyond and in close proximity to said apertured acceleration electrode; and means for cooling said deceleration electrode, said anode and target cathode assembly providing a long mean free path for the electrons produced by the ion source discharge with the combined effect of shaping the electric and magnetic fields to produce a large uniform density plasma surface at the surface of said apertured target cathode thereby permitting the extraction of a high density and high temperature ion beam through said apertured electrodes.
Claim 3
Dependent Claim
30 words
The ion source set forth in claim 1, and further including an annular lens coil mounted beyond said apertured deceleration electrode and encompassing said extracted ion beam for focusing thereof.
Claim 4
Dependent Claim
47 words
The ion source set forth in claim 1, wherein said multi-apertured target cathoDe, acceleration electrode and deceleration electrode are each 5-cm in diameter and each is provided with 109 apertures of 3.75 mm diameter, the respective spacing between said apertured electrodes being from 3 to 6 mm.
Claim 5
Dependent Claim
37 words
The ion source set forth in claim 2, wherein said ion source is operated in the continuous mode to produce an output ion beam of at least 1 ampere with ion energies from 1.5 to 5 KeV.
Claim 6
Dependent Claim
47 words
The ion source set forth in claim 3, wherein said ion source is operated in the pulsed mode with 0.1 to 0.2 pulses and 10 percent duty cycle to produce an output ion beam of at least 4 amperes at ion energies of 20 to 40 KeV.
Claim 7
Dependent Claim
43 words
The ion source set forth in claim 5, and further including a hydrogen gas cell connected to the output of said ion source to thereby produce 2.6 amperes (equivalent) of 17.5 and 35 KeV H* particles within a half angular divergence of 1.2*.
References Cited (Backward Citations)
US3238414A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-06-18 | 1976-12-18 | 1977-06-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-06-18 | 1980-12-18 | 1981-06-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-06-18 | 1984-12-18 | 1985-06-19 | $7700.00 | Window Closed / Lapsed |